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Novel Fe2O3/{101}TiO2 nanosheet array films with stable hydrophobicity and enhanced photoelectrochemical performance
Materials Chemistry and Physics ( IF 4.6 ) Pub Date : 2021-09-14 , DOI: 10.1016/j.matchemphys.2021.125226
Lei Yang 1, 2 , Chengjie Yao 1, 2 , Ruyi Wang 1, 2 , Liang Jiang 1, 2 , Wenjing Zhu 1, 2 , Mengyao Wang 1, 2 , Lingli Liu 1, 2 , Dewei Liang 1, 2 , Lei Hu 1, 2 , Chonghai Den 1, 2 , Qiyi Yin 1 , Miao Zhang 3 , Gang He 3 , Jianguo Lv 4 , Zhaoqi Sun 3
Affiliation  

Single crystal TiO2 nanosheet (TNS) arrays with coexposed {101} and {001} facets were synthesized on FTO conductive glass directly, thorn-like Fe2O3 were deposited on the {101} surface of TNS by a chemical bath deposition method. Taking advantage of different energy band positions of {101} and {001} facets, the higher band offset value between Fe2O3 and {101} facets was achieved, which would accelerate the photoexcited electrons and holes separation between Fe2O3 and {101} facets of TNS and enhance photoelectrochemical properties. Furthermore, without modification by low energy chemicals, such novel Fe2O3/TNS heterostructure electrodes exhibited stability hydrophobicity. After UV irradiation for 240 min, the contact angle of the Fe2O3/TNS (80min) films retained hydrophobicity (134.8°), which is approximately 7.1 times higher than that of bare TNS films. The optimal composite photoelectrode exhibited the highest transient photocurrent intensity (48 μA), which is about 4.4 times superior over the bare TNS. The superior photoelectrochemical properties and stability hydrophobicity were attributed to the suitable band edge positions and hydrophobic thorn-like α-Fe2O3.



中文翻译:

具有稳定疏水性和增强光电化学性能的新型 Fe2O3/{101}TiO2 纳米片阵列薄膜

在FTO导电玻璃上直接合成了具有共暴露{101}和{001}面的单晶TiO 2纳米片(TNS)阵列,通过化学浴沉积法在TNS的{101}表面上沉积了刺状Fe 2 O 3 . 服用的{101}和{001}面的不同能带的位置的优点,在较高频带的Fe之间的偏移值2 ö 3和{101}面达到了,这将加速铁之间的光激发电子和空穴分离2 ö 3和{101} TNS 的方面并增强光电化学性能。此外,无需低能化学品改性,这种新型 Fe 2 O 3/TNS异质结构电极表现出稳定的疏水性。紫外线照射 240 分钟后,Fe 2 O 3 /TNS(80分钟)薄膜的接触角保持疏水性(134.8°),约为裸 TNS 薄膜的 7.1 倍。最佳复合光电极表现出最高的瞬态光电流强度(48 μA),比裸 TNS 高约 4.4 倍。优异的光电化学性能和稳定性疏水性归因于合适的带边缘位置和疏水刺状α-Fe 2 O 3

更新日期:2021-09-16
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