Graphitic carbon nitride (CN) is considered to be an attractive material for application in photoelectrochemical (PEC) water splitting cells and photoelectronic devices. However, it is still a challenge to fabricate high-quality CN films. Herein, high-quality CN films have been synthesized via close-spaced thermal copolymerization of dicyandiamide and cyanuric acid for the first time. This method cannot only prepare continuous and uniform CN films that grow directly on a conductive substrate but also effectively adjust the film structure (thickness and morphology).

中文翻译：

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用于光电化学应用的紧密间隔热共聚制备的高质量石墨氮化碳薄膜

石墨氮化碳 (CN) 被认为是一种有吸引力的材料，可用于光电化学 (PEC) 水分解电池和光电器件。然而，制造高质量的CN薄膜仍然是一个挑战。在此，首次通过双氰胺和氰尿酸的紧密热共聚合成了高质量的CN薄膜。该方法不仅可以制备连续均匀的CN薄膜，可以直接在导电基板上生长，而且可以有效地调整薄膜结构（厚度和形貌）。