Vacuum ultraviolet (VUV) emission has recently attracted attention in low pressure processing plasmas because of the possibility of high-energy photon damages on the substrates. To quantify the VUV induced damages during the plasma processes, it is need to use of a VUV spectrometer equipped with vacuum systems not readily available in industries. In this work, therefore, we report a simple method to estimate the VUV emission intensity of hydrogen plasmas utilizing a conventional visible spectrometer widely used in plasma processes. From the measurement of hydrogen emission spectra in the visible wavelength region, the VUV emission line (Lyman-β) was calculated using the branching ratio technique and enabled the estimation of Lyman-α emission intensity based on the Boltzmann relation with given plasma parameters. In addition, it was found that the method could also predict the VUV emission intensity for high density hydrogen plasma cases by considering the self-absorption effect by hydrogen atoms.

真空紫外 (VUV) 发射最近在低压处理等离子体中引起了人们的关注，因为它可能会对基板造成高能光子损坏。为了量化等离子体过程中 VUV 引起的损伤，需要使用配备真空系统的 VUV 光谱仪，这在工业中是不容易获得的。因此，在这项工作中，我们报告了一种简单的方法来估计氢等离子体的 VUV 发射强度，该方法利用广泛用于等离子体工艺的常规可见光谱仪。通过对可见波长区域的氢发射光谱的测量，使用分支比技术计算 VUV 发射线 (Lyman-β)，并能够根据给定等离子体参数的 Boltzmann 关系估算 Lyman-α 发射强度。此外，