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Preparation and Characterization of Nickel and Aluminum-Codoped SnO2 Thin Films for Optoelectronic Applications
International Journal of Photoenergy ( IF 3.2 ) Pub Date : 2021-09-10 , DOI: 10.1155/2021/5556441
El Mahdi Bouabdalli 1, 2 , Mohamed El Jouad 1 , Taoufik Garmim 2 , Samira Touhtouh 1 , Ahmed Louardi 2, 3 , Mohamed Monkade 2 , Bouchaib Hartiti 4
Affiliation  

In this study, the coating technique was used to prepare thin layers of nickel and aluminum-codoped tin oxide (SnO2: Ni; Al). This study is aimed at exploring the influence of aluminum (Al) dopant on the structural, optical, and electrical properties of the elaborated films. X-ray diffraction (XRD) studies discovered that all deposited films (Ni-doped and Al-Ni-codoped SnO2) were polycrystalline with tetragonal (quadratic) structure and exhibited [110] preferential orientation. The optical measurements exposed that all prepared films have presented good transparency. The transmittance of Ni-Al-codoped SnO2 thin films in the visible and near-infrared regions varied between 80% and 90%; this was dependent on the concentration of dopant. The band gap was determined via the equation related to the absorption coefficient. It was deduced that the optical band gap values of thin films gradually decreased from 4.084 eV to 3.991 eV, as an effect of Al content. In addition, it was concluded that the thickness values of the films pass from 571.374 nm to 694.036 nm as an effect of Al content. Moreover, the extinction coefficient decreases with the wavelength in the UV region and then varies slightly towards longer wavelengths. Moreover, the electrical resistivity was determined using the four-point probe; it was determined that the electrical resistivity decreases from to with aluminum concentration increasing from 0 at. % to 7 at. %. The elaborated films of SnO2 codoped with Ni and Al present were highly transparent; therefore, these thin layers look promising in the use of the window layer in PV solar cells.

中文翻译:

用于光电应用的镍和铝共掺杂 SnO2 薄膜的制备和表征

在这项研究中,涂层技术用于制备镍和铝共掺杂的氧化锡(SnO 2 : Ni;Al)薄层。本研究旨在探索铝 (Al) 掺杂剂对精心制作的薄膜的结构、光学和电学性能的影响。X 射线衍射 (XRD) 研究发现所有沉积的薄膜(Ni 掺杂和 Al-Ni 共掺杂 SnO 2)都是具有四方(二次)结构的多晶,并表现出 [110] 优先取向。光学测量表明,所有制备的薄膜都具有良好的透明度。Ni-Al共掺杂SnO 2的透射率可见光和近红外区域的薄膜在 80% 到 90% 之间变化;这取决于掺杂剂的浓度。带隙通过与吸收系数相关的方程确定。据推断,由于铝含量的影响,薄膜的光学带隙值从 4.084 eV 逐渐降低到 3.991 eV。此外,得出的结论是,由于铝含量的影响,薄膜的厚度值从 571.374 nm 到 694.036 nm。此外,消光系数随着紫外区波长的增加而减小,然后随着波长的增加而略有变化。此外,电阻率是使用四点探针确定的;确定电阻率从随着铝浓度从 0 at 增加。% 到 7 处。%。与Ni和Al共掺杂的SnO 2制成的薄膜是高度透明的;因此,这些薄层在光伏太阳能电池中使用窗口层时看起来很有前景。
更新日期:2021-09-10
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