To investigate the complexity of breaking aryl CSe bond, alkyl CSe bond and alkyl CS bond by ultraviolet light, three maleimide polymers are employed as objects, including SePhP which reported in our previous work having aryl CSe bond, SePP which synthesized via radical copolymerization of N-(4-selenophenyl)-propyl maleimide and styrene having alkyl CSe bond and SPP which synthesized via radical copolymerization of N-(4-thiophenyl)-propyl maleimide and styrene having alkyl CS bond. After careful structure characteristics, SePhP, SePP and SPP are treated by ultraviolet light, as a result, only CSe bond of SePP can be broken. When SePP is irradiated by ultraviolet light in an oxygen-free condition, it can make a structure change from linear to cross-linked and refractive index decrease of polymer. Furthermore, utilizing photo-crosslinking and changing of refractive index of SePP after ultraviolet light irradiation, we realize visual photomask patterning in a simple system, which will bring great potential in display devices, anti-counterfeit labels, and etc.

为了研究紫外光破坏芳基 C Se 键、烷基 C Se 键和烷基 C S 键的复杂性，采用三种马来酰亚胺聚合物作为对象，包括我们之前报道的具有芳基 C Se 键的 SePhP，通过合成的 SePP的自由基共聚ñ具有烷基C（4-硒吩基） -丙基马来酰亚胺和苯乙烯- Se键和SPP经由的自由基共聚合成ñ具有烷基C（4-噻吩基） -丙基马来酰亚胺和苯乙烯- S键。SePhP、SePP和SPP经过仔细的结构特性，经过紫外光处理，结果只有CSePP 的 Se 键可以被破坏。当SePP在无氧条件下受到紫外光照射时，可使聚合物的结构由线性变为交联，并降低聚合物的折射率。此外，利用紫外光照射后SePP的光交联和折射率的变化，我们在一个简单的系统中实现了视觉光掩模图案化，这将在显示设备、防伪标签等方面带来巨大的潜力。