Three-dimensional (3D) nanostructure electrode based on the transparent conductive oxide (TCO) is an alternative and effective approach for increasing the performance of next-generation photovoltaic and optoelectronic devices. In this work, we prepared the vertically aligned indium tin oxide nanorods (ITO-NRs) film on silicon (100) wafer and commercial ITO thin-film coated glass substrate (ITO-TF/glass) by the glancing angle deposition (GLAD) technique. The morphologies of the ITO-NRs films were confirmed by field-emission scanning electron microscope (FE-SEM). The grazing-incident X-ray diffraction (GIXRD) observed that the ITO-NRs were formed as amorphous and nanocrystalline phase. The photoemission spectra revealed the atomic percentage of elements in ITO-NRs, and the work function of the ITO-NRs was found to increase as a function of layer thickness. To simply demonstrate their feasibility in TCO applications, the ITO-NRs films were deposited on ITO-TF/glass. We found that the resistivity of ITO-NRs on ITO-TF/glass was higher than that of a bare ITO-TF/glass substrate, which can explain through the surface recombination loss. Besides, by precisely tunning the layer thickness of ITO-NRs films, the optical transmittance was enhanced at 85.5–90.0% over the broad wavelength in the visible region with omnidirectional AR characteristic which is superior to that in conventional ITO-TF/glass. Our thickness dependence of the ITO-NRs properties discloses promising 3D TCO nanostructure in wide application.

基于透明导电氧化物 (TCO) 的三维 (3D) 纳米结构电极是提高下一代光伏和光电器件性能的替代和有效方法。在这项工作中，我们通过掠射角沉积 (GLAD) 技术在硅 (100) 晶片和商用 ITO 薄膜涂层玻璃基板 (ITO-TF/玻璃) 上制备了垂直排列的氧化铟锡纳米棒 (ITO-NRs) 膜. 通过场发射扫描电子显微镜（FE-SEM）确认了 ITO-NRs 薄膜的形貌。掠入射 X 射线衍射 (GIXRD) 观察到 ITO-NRs 形成为无定形和纳米晶相。光电发射光谱揭示了 ITO-NRs 中元素的原子百分比，并且发现 ITO-NR 的功函数随着层厚度的增加而增加。为了简单地证明它们在 TCO 应用中的可行性，将 ITO-NRs 薄膜沉积在 ITO-TF/玻璃上。我们发现 ITO-TF/玻璃上 ITO-NRs 的电阻率高于裸 ITO-TF/玻璃基板的电阻率，这可以通过表面复合损失来解释。此外，通过精确调整 ITO-NRs 薄膜的层厚，在可见光区的宽波长范围内光学透射率提高了 85.5-90.0%，具有全向 AR 特性，优于传统的 ITO-TF/玻璃。我们对 ITO-NRs 特性的厚度依赖性揭示了具有广泛应用前景的 3D TCO 纳米结构。ITO-NRs 薄膜沉积在 ITO-TF/玻璃上。我们发现 ITO-TF/玻璃上 ITO-NRs 的电阻率高于裸 ITO-TF/玻璃基板的电阻率，这可以通过表面复合损失来解释。此外，通过精确调整 ITO-NRs 薄膜的层厚，在可见光区的宽波长范围内光学透射率提高了 85.5-90.0%，具有全向 AR 特性，优于传统的 ITO-TF/玻璃。我们对 ITO-NRs 特性的厚度依赖性揭示了具有广泛应用前景的 3D TCO 纳米结构。ITO-NRs 薄膜沉积在 ITO-TF/玻璃上。我们发现 ITO-TF/玻璃上 ITO-NRs 的电阻率高于裸 ITO-TF/玻璃基板的电阻率，这可以通过表面复合损失来解释。此外，通过精确调整 ITO-NRs 薄膜的层厚，在可见光区的宽波长范围内光学透射率提高了 85.5-90.0%，具有全向 AR 特性，优于传统的 ITO-TF/玻璃。我们对 ITO-NRs 特性的厚度依赖性揭示了具有广泛应用前景的 3D TCO 纳米结构。在可见光区的宽波长范围内，光学透射率提高了 85.5-90.0%，具有全向 AR 特性，优于传统的 ITO-TF/玻璃。我们对 ITO-NRs 特性的厚度依赖性揭示了具有广泛应用前景的 3D TCO 纳米结构。在可见光区域的宽波长范围内，光学透射率提高了 85.5-90.0%，具有全向 AR 特性，优于传统的 ITO-TF/玻璃。我们对 ITO-NRs 特性的厚度依赖性揭示了具有广泛应用前景的 3D TCO 纳米结构。