Structural and tribo-mechanical properties of Zr-O-N films deposited by reactive magnetron sputtering in a mixture of Ar (flow rate = 80 sccm), N₂ (flow rate = 20 sccm) and O₂ with a varying flow rate of 0 to 12 sccm were investigated. The films were characterized using scanning electron microscopy, energy dispersive x-ray analysis, atomic force microscopy, nanoindentation and wear tests. Oxygen content have a significant effect on the microstructure, wettability, tribo-mechanical properties of Zr-O-N films. The Zr-O-N films showed a dense structure with a mixture of zirconium oxides and nitrides and the preferred orientation changed from (111) ZrN to (200) ZrN with increasing O₂ flow rate. The ZrON film, deposited at an oxygen flow rate of 10 sccm exhibited the highest contact angle (147°), the highest hardness (27.1 GPa), the lowest friction coefficient (0.36) and the lowest wear rate (5.8 × 10⁻⁷ mm³.Nm⁻¹). The improvement in the tribological performance of the ZrON film deposited at 10 sccm is attributed to the improved hardness and increased H/E and H³/E² ratios, due to the formation of a hard solid solution by the diffusion of oxygen.

通过反应磁控溅射在 Ar（流速 = 80 sccm）、N ₂（流速 = 20 sccm）和 O ₂的混合物中沉积的 Zr-ON 薄膜的结构和摩擦机械性能，流速从 0 到 12 sccm 进行了调查。使用扫描电子显微镜、能量色散 X 射线分析、原子力显微镜、纳米压痕和磨损测试对薄膜进行表征。氧含量对Zr-ON薄膜的微观结构、润湿性、摩擦机械性能有显着影响。Zr-ON 薄膜显示出致密的结构，其中含有锆氧化物和氮化物的混合物，随着 O _{2 的}增加，择优取向从 (111) ZrN 变为 (200) ZrN流速。以 10 sccm 的氧气流速沉积的 ZrON 薄膜表现出最高的接触角 (147°)、最高的硬度 (27.1 GPa)、最低的摩擦系数 (0.36) 和最低的磨损率 (5.8 × 10 ^-7 mm) ³ .Nm ^-1）。以 10 sccm 沉积的 ZrON 膜摩擦学性能的改善归因于硬度的提高以及H/E和H ³ /E ²比率的增加，这是由于氧扩散形成了硬固溶体。