Hydrothermal growth method was used to grow the zinc oxide (ZnO) thick films on ZnO seed layer previously deposited by RF magnetron sputtering technique. The effect of introducing of zinc acetate and chloride salts on the structure, chemical and physical properties of the obtained films was investigated. Scanning electron microscope (SEM) and atomic force microcopy (AFM) were utilized to both justify the nanostructure growth of the ZnO thick films deposited by hydrothermal growth method, and to identify their morphology. Energy dispersive X-ray spectroscopy (EDX) and X-ray photoelectron spectroscopy (XPS) confirmed the elemental stoichiometry of the prepared ZnO thick films with low contamination. X-ray diffraction (XRD), Raman spectroscopy, and Fourier-transform infrared spectroscopy (FTIR) characterizations approved the texturation of the ZnO thick films prepared by hydrothermal growth method and verified the nonstructural growth with (002) preferred orientation as well as hexagonal phase. XRD technique indicated that the ZnO films had a good quality (big grain size and preferential orientation) and the Raman and FTIR studies confirmed the XRD results. Moreover, photoluminescence (PL) spectroscopy verified the optoelectronic behavior and demonstrated a potential optical application in this field.

使用水热生长方法在先前通过射频磁控溅射技术沉积的 ZnO 种子层上生长氧化锌 (ZnO) 厚膜。研究了乙酸锌和氯化物盐的引入对所得薄膜的结构、化学和物理性能的影响。利用扫描电子显微镜 (SEM) 和原子力显微镜 (AFM) 来证明通过水热生长方法沉积的 ZnO 厚膜的纳米结构生长是合理的，并确定它们的形态。能量色散 X 射线光谱 (EDX) 和 X 射线光电子能谱 (XPS) 证实了制备的低污染 ZnO 厚膜的元素化学计量。X射线衍射（XRD）、拉曼光谱、和傅里叶变换红外光谱 (FTIR) 表征证实了通过水热生长法制备的 ZnO 厚膜的织构，并验证了具有 (002) 择优取向和六方相的非结构生长。XRD 技术表明 ZnO 薄膜具有良好的质量（大晶粒尺寸和优先取向），拉曼和 FTIR 研究证实了 XRD 结果。此外，光致发光（PL）光谱验证了光电行为并展示了该领域的潜在光学应用。XRD 技术表明 ZnO 薄膜具有良好的质量（大晶粒尺寸和优先取向），拉曼和 FTIR 研究证实了 XRD 结果。此外，光致发光（PL）光谱验证了光电行为并展示了该领域的潜在光学应用。XRD 技术表明 ZnO 薄膜具有良好的质量（大晶粒尺寸和优先取向），拉曼和 FTIR 研究证实了 XRD 结果。此外，光致发光（PL）光谱验证了光电行为并展示了该领域的潜在光学应用。