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Research and application of an in-service chemical decontamination process for high temperature and high pressure circuit
Journal of Radioanalytical and Nuclear Chemistry ( IF 1.6 ) Pub Date : 2021-08-18 , DOI: 10.1007/s10967-021-07946-y
Shuang Dai 1, 2 , Siyan Wang 1, 2 , Xinzhen Li 1, 2 , Yong Liu 1, 2 , Changqing Teng 1 , Yunming Chen 1, 2 , Qi Cao 1, 2
Affiliation  

Here we present a newly developed two-step oxidative-reductive in-service chemical decontamination process suitable for high temperature and high pressure circuit (HTHPC) decontamination in a pressurized water reactor (PWR). Various process parameters on the corrosion depth and decontamination factor were investigated by employing different kinds of detergents. Under optimal conditions, the average decontamination factor is about 60.0 and the maximum corrosion depth is 0.20 um. Actual decontamination by applying this process to HTHPC, the dose field in most locations decreased by more than 89% and it’s proved that the decontamination process is completely suitable for the decontamination of PWRs in service.



中文翻译:

高温高压回路在役化学除污工艺研究与应用

在这里,我们介绍了一种新开发的两步氧化还原在役化学净化工艺,适用于压水反应堆 (PWR) 中的高温高压回路 (HTHPC) 净化。通过使用不同种类的清洁剂,研究了腐蚀深度和去污因子的各种工艺参数。在最佳条件下,平均去污因子约为60.0,最大腐蚀深度为0.20 um。将该工艺应用于高温高压发电实际去污,大部分位置的剂量场降低了89%以上,证明该去污工艺完全适用于在役压水堆的去污。

更新日期:2021-08-19
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