The substituted pyrrole monomer, N–(2–cyanoethyl)pyrrole, was electropolymerised in a 70% water and 30% ethanol solution with ClO₄^– and H₂PO₄^– as the dopant species to give nanowires at short electropolymerisation times and microwires at longer deposition periods. On adding toluene to the electropolymerisation solution, hollow microtubes were formed. This was attributed to the adsorption of toluene droplets at the electrode surface which served to separate the dopants from the monomer, with the monomer being highly soluble in the toluene droplet and the inorganic dopants soluble in the water/ethanol mixture. As a result electropolymerisation was confined to the toluene-water/ethanol interface. These polymer systems exhibit redox activity with the oxidation wave centred at about 0.40 V vs SCE, and the broader reduction wave positioned between 0.75 V and 0.25 V vs SCE. Although N-substitution reduces the conductivity of the polymer, various copper deposits, including cubes, leaves and hierarchical structures were deposited at the microwires and microtubes using high overpotentials. The hierarchical structures were wrapped around the microtubes at considerable distances, typically 3–4 µm, from the substrate.

取代的吡咯单体 N-(2-氰乙基)吡咯在 70% 的水和 30% 的乙醇溶液中与 ClO ₄ ^–和 H ₂ PO ₄ ^–进行电聚合作为掺杂剂种类，在较短的电聚合时间内提供纳米线，在较长的沉积周期内提供微线。在向电聚合溶液中加入甲苯后，形成中空微管。这归因于甲苯液滴在电极表面的吸附作用，用于将掺杂剂与单体分离，单体高度可溶于甲苯液滴，而无机掺杂剂可溶于水/乙醇混合物。因此，电聚合仅限于甲苯-水/乙醇界面。这些聚合物系统表现出氧化还原活性，氧化波集中在约 0.40 V vs SCE，更宽的还原波位于 0.75 V 和 0.25 V vs SCE 之间。尽管 N 取代会降低聚合物的导电性，但各种铜沉积物，包括立方体、使用高过电位将叶子和分层结构沉积在微丝和微管上。分层结构以相当远的距离缠绕在微管上，通常为 3-4 µm，距离基板。