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UV-LED projection photolithography for high-resolution functional photonic components
Microsystems & Nanoengineering ( IF 7.9 ) Pub Date : 2021-08-17 , DOI: 10.1038/s41378-021-00286-7
Lei Zheng 1, 2 , Urs Zywietz 3 , Tobias Birr 3 , Martin Duderstadt 3 , Ludger Overmeyer 2, 4 , Bernhard Roth 1, 2 , Carsten Reinhardt 5
Affiliation  

The advancement of micro- and nanostructuring techniques in optics is driven by the demand for continuous miniaturization and the high geometrical accuracy of photonic devices and integrated systems. Here, UV-LED projection photolithography is demonstrated as a simple and low-cost approach for rapid generation of two-dimensional optical micro- and nanostructures with high resolution and accuracy using standard optics only. The developed system enables the projection of structure patterns onto a substrate with 1000-fold demagnification. Photonic devices, e.g., waveguides and microring resonators, on rigid or flexible substrates with varied geometrical complexity and overall structure dimensions from the nanometer to centimeter scale were successfully prepared. In particular, high-resolution gratings with feature sizes down to 150 nm and periods as small as 400 nm were realized for the first time by this approach. Waveguides made of doped laser active materials were fabricated, and their spontaneous emission was detected. The demonstrated superior performance of the developed approach may find wide applications in photonics, plasmonics, and optical materials science, among others.



中文翻译:

用于高分辨率功能光子组件的 UV-LED 投影光刻

光学中微米和纳米结构技术的进步是由对光子器件和集成系统的连续小型化和高几何精度的需求推动的。在这里,UV-LED 投影光刻被证明是一种简单且低成本的方法,用于仅使用标准光学器件快速生成具有高分辨率和准确性的二维光学微纳米结构。开发的系统能够以 1000 倍的缩小率将结构图案投影到基板上。光子器件,例如波导和微环谐振器,在刚性或柔性基板上成功制备,具有不同的几何复杂性和从纳米到厘米级的整体结构尺寸。特别是,通过这种方法首次实现了特征尺寸低至 150 nm、周期低至 400 nm 的高分辨率光栅。制造了由掺杂的激光活性材料制成的波导,并检测了它们的自发发射。所开发方法所展示的卓越性能可能会在光子学、等离子体学和光学材料科学等领域得到广泛应用。

更新日期:2021-08-17
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