Due to its high practicability, metal assisted chemical etching (MACE) has become a popular silicon micro-nano structure preparation method. This paper explores the metal nanoparticle film dissolution and re-deposition evolution behavior in oxidizing HF solution during the MACE process. The results show Ag nanoparticles experience both oxidation dissolve and reduction deposit during MACE in HF–H₂O₂–H₂O and HF–Fe(NO₃)₃–H₂O corrosion solution. The Au nanoparticle can remain stable in the HF–Fe(NO₃)₃–H₂O solution, providing a strategy to keep the patterns’ high etching accuracy of the silicon micro-nano structure. This work illuminates the reaction principle and provides a new insight to improving the etching accuracy, stability, and speed of the MACE technology.

金属辅助化学蚀刻（MACE）由于其实用性高，已成为一种流行的硅微纳结构制备方法。本文探讨了MACE过程中氧化HF溶液中金属纳米颗粒薄膜溶解和再沉积演化行为。结果表明，Ag 纳米粒子在 HF-H ₂ O ₂ -H ₂ O 和 HF-Fe(NO ₃ ) ₃ -H ₂ O 腐蚀溶液中的 MACE 过程中经历了氧化溶解和还原沉积。Au纳米粒子可以在HF-Fe(NO ₃ ) ₃ -H _{2 中}保持稳定O 解决方案，提供了一种策略来保持硅微纳结构的图案的高蚀刻精度。这项工作阐明了反应原理，并为提高 MACE 技术的蚀刻精度、稳定性和速度提供了新的见解。