A pulse-modulated atmospheric pressure radio frequency (RF) plasma is used to prepare a dense TiO₂ thin film at a low temperature. With certain plasma on time (T_on = 50 ms), the discharge temperature decreases with plasma off time (T_off), and the lengths of the thin films increase. An anatase TiO₂ thin film was successfully deposited on a temperature-sensitive substrate (polyethylene terephthalate). The transmission electron microscope (TEM) results show that the film is composed from anatase TiO₂ nanoparticles grown through plasma in 0.07 s. By using laser light scattering, the TiO₂ particles are found to be trapped above the substrate at about 0.27 mm during plasma on, which is close to the simulated plasma sheath thickness (0.26 mm). The deposition mechanism of pulse-modulated atmospheric pressure RF plasma has been investigated.

中文翻译：

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通过大气压脉冲调制等离子体深入了解致密锐钛矿 TiO2 薄膜的低温沉积

脉冲调制大气压射频(RF)等离子体用于在低温下制备致密的TiO ₂薄膜。在一定的等离子体开启时间（T _on  = 50 ms）下，放电温度随着等离子体关闭时间（T _off）而降低，薄膜的长度增加。锐钛矿 TiO ₂薄膜成功地沉积在温度敏感的基材（聚对苯二甲酸乙二醇酯）上。透射电子显微镜 (TEM) 结果表明，该薄膜由锐钛矿型 TiO ₂纳米颗粒在 0.07 秒内通过等离子体生长而成。通过使用激光散射，TiO ₂发现在等离子体开启期间，粒子被困在基板上方约 0.27 毫米处，接近模拟的等离子体鞘层厚度 (0.26 毫米)。研究了脉冲调制大气压射频等离子体的沉积机理。