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Review on helium behaviors in nanochannel tungsten film
Tungsten Pub Date : 2021-07-27 , DOI: 10.1007/s42864-021-00097-3
Wen-Jing Qin 1, 2 , Wei Guo 2 , Tao Cheng 2 , Jun Tang 2 , Chang-Zhong Jiang 2 , Feng Ren 2
Affiliation  

Tungsten (W) as plasma facing material (PFM) needs to face an unprecedented harsh environment in the fusion reactor, which puts forward high requirements for its radiation tolerance. Among the many challenges, the rapid accumulation of helium (He) atoms to form numerous bubbles or even “fuzzy” nanostructure leads to swelling and embrittlement of W matrix and seriously shorten its service life, which is one of the most serious problems faced by PFM-W at present. In this review, we summarize the recent works on the nanochannel W films with high surface-to-volume ratio deposited by magnetron sputtering, and the behaviors of He in the nanochannel W films at different fusion-related irradiation environment. Experimental and simulation results showed that the nanochannel W films have better radiation tolerance performance in managing He behaviors than that of commercial bulk W.



中文翻译:

纳米通道钨膜中氦行为的研究进展

钨(W)作为面向等离子体的材料(PFM)需要在聚变反应堆中面对前所未有的恶劣环境,对其辐射耐受性提出了很高的要求。在众多挑战中,氦(He)原子的快速积累形成无数气泡甚至“模糊”的纳米结构,导致W基体膨胀、脆化,严重缩短其使用寿命,这是PFM面临的最严重的问题之一-W 目前。在这篇综述中,我们总结了最近通过磁控溅射沉积的具有高表面积体积比的纳米通道 W 薄膜的工作,以及在不同的与聚变相关的辐照环境下纳米通道 W 薄膜中 He 的行为。

更新日期:2021-07-27
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