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Response of laboratory plasma influenced by a feedback loop to external force
Progress of Theoretical and Experimental Physics ( IF 3.5 ) Pub Date : 2021-06-11 , DOI: 10.1093/ptep/ptab076
Takao Fukuyama 1 , Masahiro Omoto 1
Affiliation  

This study experimentally examines the sensitivity of laboratory plasma influenced by a feedback loop to applied external force, with the objective of gaining insight into chaos control in plasma. The ionization waves in laboratory plasma are adopted as the medium of a typical nonlinear system. In the case of a system without the influence of feedback (defined as system A), the orbit of the chaotic system changes to a periodic one as the intensity of the applied external force increases. In the case of a system with the influence of feedback (defined as system B), the chaotic orbit changes to a periodic one by the application of external force with lower intensity (approximately two-thirds) compared to system A. This reveals that the feedback loop enhances the response of the system to external forces.

中文翻译:

受反馈回路影响的实验室等离子体对外力的响应

本研究通过实验检验了受反馈回路影响的实验室等离子体对施加外力的敏感性,目的是深入了解等离子体中的混沌控制。采用实验室等离子体中的电离波作为典型非线性系统的介质。在没有反馈影响的系统(定义为系统 A)的情况下,随着所施加外力强度的增加,混沌系统的轨道变为周期性轨道。在具有反馈影响的系统(定义为系统 B)的情况下,通过施加与系统 A 相比强度较低(约三分之二)的外力,混沌轨道变为周期性轨道。这表明反馈回路增强了系统对外力的响应。
更新日期:2021-06-11
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