Gas desorption from copper tubes coated with Pd or Pd/TiZrV in response to synchrotron radiation was investigated. Following activation (250 °C for 4 h), Pd/TiZrV film exhibited H₂ desorption yield that was over one order of magnitude lower than that from TiZrV film. The Pd and Pd/TiZrV films also desorbed smaller amount of CO and CO₂ during exposure. Compared to the TiZrV film, the Pd film exhibited a higher H₂ pumping rate and was more likely to release H₂ and CO during activation. These characteristics are considered to have reduced the photon-stimulated desorption yield of the Pd layer.

中文翻译：

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从 Pd 或 Pd/TiZrV 涂层铜管的同步辐射刺激解吸

研究了响应同步辐射从涂有 Pd 或 Pd/TiZrV 的铜管解吸气体。活化后（250°C 持续 4 小时），Pd/TiZrV 薄膜表现出的 H ₂解吸率比 TiZrV 薄膜低一个数量级以上。Pd 和 Pd/TiZrV 薄膜在曝光过程中也解吸了少量的 CO 和 CO ₂。与TiZrV 薄膜相比，Pd 薄膜表现出更高的H ₂泵送速率，并且在活化过程中更可能释放H ₂和CO。这些特性被认为降低了 Pd 层的光子刺激解吸产率。