Structural colors attract widespread attention in the fields of display and imaging devices due to their durable, vivid, and vibrant colors with subdiffraction resolution. Dielectrics with high refractive indices and negligible optical loss can achieve high-quality structural colors that exceed the standard RGB (sRGB) color gamut. However, the fabrication processes are complicated and costly as well as limited in color-printing areas. Herein, a facile strategy is developed to achieve scalable nanostructured silicon to enable various structural sRGB colors via a cost-effective and straightforward wet-chemical etching method. By adjusting the etching time, the nanostructured silicon can easily tune its color from ultraviolet to red, which occupies 60% of the sRGB color space. An optical simulation method uncovers the structure color generation mechanism, which indicates the structure color correlated with a random nanostructure reflection mode. In addition, different random-shaped patterned displays are demonstrated on the nanostructured silicon with a centimeter-sized substrate. This work provides a facile and efficient way to build structural color on all-dielectric silicon substrates.

中文翻译：

---

具有全介电标准 RGB 颜色的可扩展纳米结构硅

结构色因其持久、生动和鲜艳的颜色以及亚衍射分辨率而在显示和成像设备领域受到广泛关注。具有高折射率和可忽略不计光损耗的电介质可以实现超出标准 RGB (sRGB) 色域的高质量结构色。然而，制造过程复杂且成本高，并且在彩色印刷领域受到限制。在此，开发了一种简便的策略来实现可扩展的纳米结构硅，以通过具有成本效益和直接的湿化学蚀刻方法实现各种结构的 sRGB 颜色。通过调整蚀刻时间，纳米结构硅可以轻松地将其颜色从紫外线调整为红色，占据 sRGB 颜色空间的 60%。一种光学模拟方法揭示了结构颜色的产生机制，表明与随机纳米结构反射模式相关的结构颜色。此外，在具有厘米大小的基板的纳米结构硅上展示了不同的随机形状的图案显示。这项工作提供了一种在全介电硅基板上构建结构颜色的简便有效的方法。