This work presents the development and characterization of a Silicon based MEMS vibrating mesh atomizer for use in Spin-spray deposition of low viscosity liquids. The device design, fabrication process, and application of MEMS atomizer for spin-spray method is discussed. The new spin-spray atomizer is demonstrated using spin on glass and Su-8 photoresist. Spin on glass was used to create a SiO ₂ layer on silicon substrates with the above-mentioned method. The experimental study compares the new spin-spray method with conventional spin coating based on uniformity, 3D-topography coating, etch rate, film stress, and surface roughness. Low viscosity SU-8 was used to further validate the concept of using the vibrating mesh device to pattern planar and 3D topographical structures. The results demonstrate increased uniformity and less wasted chemicals using spin-spray compared to spin coating deposition. The new vibrating mesh device is smaller, has enhanced droplet size control, easy to integrate into a standard spin coater, and uses less power than traditional ultrasonic spin-spray deposition methods. In addition, the new spin-spray method demonstrated increased conformal coating of 3D microstructures of $> 40~\mu \text{m}$ thick structures compared to standard spin coating. [2021-0040]

中文翻译：

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用于旋转喷涂沉积的振动网状雾化器

这项工作介绍了硅基 MEMS 振动网状雾化器的开发和表征，用于低粘度液体的旋转喷雾沉积。讨论了旋喷法MEMS雾化器的器件设计、制造工艺和应用。使用自旋玻璃和 Su-8 光刻胶演示了新型自旋喷雾雾化器。使用旋涂玻璃制造 SiO ₂用上述方法在硅衬底上形成层。实验研究基于均匀性、3D 形貌涂层、蚀刻速率、薄膜应力和表面粗糙度，将新的旋喷方法与传统旋涂方法进行了比较。低粘度 SU-8 用于进一步验证使用振动网装置来图案化平面和 3D 地形结构的概念。结果表明，与旋涂沉积相比，使用旋喷提高了均匀性并减少了化学品浪费。新的振动筛网装置更小，增强了液滴尺寸控制，易于集成到标准旋涂机中，并且比传统的超声旋喷沉积方法使用更少的功率。此外，新的旋喷方法证明了 3D 微结构的保形涂层增加 $> 40~\mu \text{m}$ 与标准旋涂相比较厚的结构。[2021-0040]