In this study, one of the advanced oxidation processes (AOPs) was selected for the pharmaceutical’s treatment from wastewaters. For this purpose, deep eutectic solvent (DES) consisting of choline-chloride and ethylene glycol at 1:2 M ratio was synthesized for preparation of zinc oxide/graphene oxide (ZnO/GO/DES) photocatalyst for degradation of the cefixime trihydrate (CFX) as a model of antibiotic via UV-A radiation. Photocatalytic degradation of CFX was statistically maximized as a response through the design of the experiments using a face-centered central composite design (FCCCD). The catalyst dose (0.3–0.7 g L⁻¹), pH of media (4–10), and antibiotic concentration (20–50 mg L⁻¹) were taken as a factor to construct the experimental design. Besides, photocatalytic reaction results showed that using DES served as at high degradation performance as 86% CFX degradation under 0.532 g L⁻¹ catalyst dose, 20.13 mg L⁻¹ initial CFX concentration, and 4.03 pH using UV-A radiation. Photocatalysts with DES have proved a crucial catalyst in antibiotic resistance in water treatment. Thus, the prepared deep eutectic solvent-based photocatalyst indicates marvelous effects for eliminating CFX.

在这项研究中，选择了一种高级氧化工艺 (AOP) 来处理废水中的药物。为此，合成了由氯化胆碱和乙二醇以 1:2 M 比例组成的深共熔溶剂 (DES)，用于制备氧化锌/氧化石墨烯 (ZnO/GO/DES) 光催化剂，用于降解头孢克肟三水合物 (CFX) ) 作为通过 UV-A 辐射的抗生素模型。通过使用面心中心复合设计 (FCCCD) 的实验设计，CFX 的光催化降解在统计上被最大化作为响应。催化剂剂量（0.3-0.7 g L ^-1）、介质的 pH 值（4-10）和抗生素浓度（20-50 mg L ^-1) 作为构建实验设计的一个因素。此外，光催化反应结果表明，在 0.532 g L ^-1催化剂剂量、20.13 mg L ^-1初始 CFX 浓度和使用 UV-A 辐射的 4.03 pH条件下，使用 DES 具有高降解性能，86% CFX 降解。具有 DES 的光催化剂已被证明是水处理中抗生素抗性的关键催化剂。因此，制备的深共晶溶剂型光催化剂显示出消除CFX的奇妙效果。