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Low threshold voltage blue light emitting diodes based on thulium doped gallium oxides
Applied Physics Express ( IF 2.3 ) Pub Date : 2021-07-13 , DOI: 10.35848/1882-0786/ac10a7
Zewei Chen , Katsuhiko Saito , Tooru Tanaka , Qixin Guo

Thulium doped gallium oxides (Tm-Ga2O3) films were deposited on Si substrates by the pulsed laser deposition method. Blue emissions (476nm and 460nm) can be observed by the naked eye from Tm-Ga2O3/Si light emitting diodes (LEDs). The threshold voltage of Tm-Ga2O3/Si LEDs is 6.3V, which is lower than that of Tm-GaN/Si devices. By combining our previously reported green emission from Er-Ga2O3 and red emission from Eu-Ga2O3, strong blue emission from Tm-Ga2O3 can realize the full-color LEDs with the single host of Ga2O3. These results open a pathway for integrating Ga2O3 based full-color LEDs with mainstream Si technology.



中文翻译:

基于铥掺杂氧化镓的低阈值电压蓝光发光二极管

掺铥的氧化镓(Tm-Ga 2 O 3)薄膜通过脉冲激光沉积方法沉积在硅衬底上。Tm-Ga 2 O 3 /Si 发光二极管 (LED) 的蓝光发射(476 纳米和 460 纳米)可以通过肉眼观察到。Tm-Ga 2 O 3 /Si LED的阈值电压为 6.3V,低于 Tm-GaN/Si 器件的阈值电压。通过结合我们之前报道的 Er-Ga 2 O 3 的绿光发射和 Eu-Ga 2 O 3 的红光发射,Tm-Ga 2 O 3 的强蓝光发射可以实现单主体 Ga 2的全彩 LED3。这些结果为将基于Ga 2 O 3的全彩 LED 与主流硅技术集成开辟了道路。

更新日期:2021-07-13
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