The surface composition and stability of ZnGa₂O₄:Mn²⁺ green phosphor were evaluated using Auger electron spectroscopy (AES) under electron beam irradiation in vacuum and oxygen (4.0 × 10⁻⁷ mbar). The surface chemistry was monitored while measuring the cathodoluminescence (CL) intensity. The Auger peak-to-peak heights (APPHs) of Zn and Ga were stable during irradiation in vacuum for a beam current of 1 μA, whereas the APPH of Ga initially slightly increased during irradiation in vacuum and oxygen for a beam current of 3 μA. This was accompanied with a slight initial decrease of C contamination. The APPH of O decreased during irradiation in vacuum for a beam current of 3 μA, whereas it slightly increased during irradiation in oxygen. In vacuum the CL intensity exhibited a slight initial decrease during irradiation, after which it recovered and stabilized, whereas in oxygen the CL intensity decreased initially and then stabilized. The profile of the CL spectra did not show noticeable changes as a result of irradiation. TL measurements showed that the ZnGa₂O₄:Mn²⁺ activated with UV or e-beam exhibited two broad peaks. The differences were attributed to the change in concentrations of Zn and O vacancies that could be caused by e-beam irradiation.

ZnGa ₂ O ₄ :Mn ²⁺绿色荧光粉的表面组成和稳定性使用俄歇电子能谱（AES）在真空和氧气（4.0×10 ^-7 毫巴）。在测量阴极发光 (CL) 强度的同时监测表面化学。Zn 和 Ga 的俄歇峰峰值 (APPH) 在真空辐照 1 μA 束流期间稳定，而 Ga 的 APPH 在真空和氧气辐照过程中最初略微增加，束流为 3 μA . 这伴随着 C 污染的轻微初始下降。O 的 APPH 在真空中辐照 3 μA 的束流期间降低，而在氧气辐照期间略有增加。在真空中，CL 强度在辐照期间表现出轻微的初始下降，之后恢复并稳定，而在氧气中，CL 强度最初下降然后稳定。由于辐照，CL 光谱的轮廓没有显示出明显的变化。₂ O ₄ :Mn ²⁺用紫外线或电子束活化表现出两个宽峰。这种差异归因于可能由电子束照射引起的 Zn 和 O 空位浓度的变化。