The present study aims to assess the photodegradation of three polycyclic musk compounds (OTNE, HHCB, and AHTN) and one disinfectant (triclosan) under simulated sunlight irradiation using a halogen lamp in pH-adjusted DI water, natural waters, and humic acid solution. The degradation induced by hydroxyl radical was examined with the addition of 2-propanol. The targeted compounds were considerably decreased in several days under irradiation, except for triclosan for blank water, with the pseudo-first-order rate constants in the order of one per day at the maximum. They were degraded with the paths of both direct and indirect photosensitized processes, with the hydroxyl radical and others. The main findings were that OTNE direct photolysis was possibly influenced by pH. HHCB photosensitized pathway was more eminent than that of AHTN, and triclosan was degraded mostly by the photosensitized process. The major influential factors were found to differ with the compounds and solution conditions, which intensifies the importance of the consideration of key factors for predicting the degree of photodegradation in water environments.

本研究旨在评估三种多环麝香化合物（OTNE、HHCB 和 AHTN）和一种消毒剂（三氯生）在模拟阳光照射下在 pH 调节的去离子水、天然水和腐殖酸溶液中使用卤素灯的光降解。通过添加 2-丙醇检测由羟基自由基引起的降解。除了空白水的三氯生外，目标化合物在辐照下的几天内显着减少，伪一级速率常数最大为每天一个。它们通过直接和间接光敏过程的路径、羟基自由基和其他途径降解。主要发现是 OTNE 直接光解可能受 pH 值的影响。HHCB 光敏通路比 AHTN 更显着，三氯生主要通过光敏过程降解。发现主要影响因素因化合物和溶液条件而异，这加强了考虑预测水环境中光降解程度的关键因素的重要性。