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An effective lithography training module adapting semianalytical calculation approaches
Journal of the Society for Information Display ( IF 2.3 ) Pub Date : 2021-07-01 , DOI: 10.1002/jsid.1067
Atilla Ozgur Cakmak 1 , Evrim Colak 2 , Osama O. Awadelkarim 1
Affiliation  

A complete, self-sufficient package is prepared to teach the fundamental concepts of lithography. The adapted semianalytical approaches promise to illustratively create an ideal engaging environment for efficiently training next generation lithographers. The presented educational tool, which integrates the well-known modeling methods from the literature, is shown to capture the photolithography process step by step while offering the students a remote, hands-on feeling from introductory to graduate-level work. The importance of optical and chemistry related parameters are discussed with the aim of creating a useful laboratory assessment package for the educators to be easily integrated into their curriculum.

中文翻译:

一种适用于半解析计算方法的有效光刻培训模块

准备了一个完整的、自给自足的软件包来教授光刻的基本概念。适应的半分析方法有望为有效培训下一代光刻机创造一个理想的参与环境。所展示的教育工具整合了文献中众所周知的建模方法,可以逐步捕捉光刻过程,同时为学生提供从入门到研究生级别工作的远程、亲身实践的感觉。讨论了光学和化学相关参数的重要性,目的是为教育工作者创建一个有用的实验室评估包,以便轻松地将其整合到他们的课程中。
更新日期:2021-07-01
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