This paper presents an enhanced seeding rule for the design and fabrication of line seeds for glancing angle deposition (GLAD). GLAD is capable of creating nanometer-level three-dimensional (3D) features by ballistic shadowing from natural/artificial nuclei at oblique incident angles in physical vapor deposition processes. The GLAD features, including columns, springs, zigzags, and ribbons, are building blocks of a wide range of optical, mechanical, and sensing applications. Nanoribbons can be obtained from sub-100 nm-wide line seeds from GLAD; however, volume production of the ultralong fine lines is difficult by conventional fabrication techniques. Additionally, a general process for designing line seeds for creating nanoribbons, especially line seeds with two-dimensional cross sections, is lacking. This paper fills the gaps by integrating the design, fabrication, and optimization of line seeds for obtaining nanoribbons by GLAD. In this paper, a new seeding theory for line seeds for GLAD is proposed by first introducing an empirical model for accurately determining the percent coverage of the deposition for an incident angle over 70°. We discuss the optimum shape and size of the lines for obtaining continuous solid ribbons by matching the percent coverage under predetermined incident angles in a GLAD process. The thickness of the GLAD ribbons is controllable by the geometric parameters of the seeds; ∼100 nm-thick ribbons are obtained from micrometer-width lines created using conventional photolithography. The design process of parabolic cross-sectional line seeds is demonstrated as an example of applying the upgraded seeding rule. Finally, the fabrication of centimeter-long nanoribbons and the use of the ribbons as templates for nanochannels are demonstrated.

中文翻译：

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掠射角沉积线种的设计

本文提出了一种用于设计和制造用于掠射角沉积 (GLAD) 的线种子的增强播种规则。GLAD 能够通过物理气相沉积过程中倾斜入射角的自然/人造原子核的弹道阴影来创建纳米级三维 (3D) 特征。GLAD 功能，包括柱、弹簧、锯齿形和带状，是广泛的光学、机械和传感应用的构建块。纳米带可以从 GLAD 的亚 100 nm 宽的线种子中获得；然而，超长细线的量产很难通过传统的制造技术来实现。此外，缺乏用于设计用于创建纳米带的线种子，尤其是具有二维横截面的线种子的一般过程。本文通过整合线种子的设计、制造和优化来填补空白，以通过 GLAD 获得纳米带。在本文中，通过首先引入一个经验模型来准确确定入射角超过 70° 的沉积覆盖率，提出了一种新的 GLAD 线种子播种理论。我们讨论了通过匹配 GLAD 过程中预定入射角下的百分比覆盖率来获得连续实心带的最佳线条形状和尺寸。GLAD 条带的厚度由种子的几何参数控制；从使用传统光刻法创建的微米宽度线获得约 100 nm 厚的带。抛物线截面线种子的设计过程作为应用升级的播种规则的示例进行了演示。最后，