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Effect of annealing on crystallization behavior in Cu15Zr85 amorphous film
Journal of Alloys and Compounds ( IF 6.2 ) Pub Date : 2021-06-22 , DOI: 10.1016/j.jallcom.2021.160913
Xuan Li , Lei Zuo , Tao Zhang

The crystallization in Cu15Zr85 amorphous film was studied by using molecular dynamics simulation in a wide annealing temperature region. The effect of annealing temperature on crystallization behavior was evaluated. The degree of crystallization increases firstly and then decreases with the increasing of annealing temperature in Cu15Zr85 amorphous film. A comparison of interior and Surface-A components shows that Surface-A component has higher crystallization rate at low annealing temperature and lower degree of crystallization at high annealing temperature because of faster atomic diffusion. Structural evolution of surface monolayer is unique during annealing. No discernable crystal-like structure is found after annealed in the surface monolayer by directly observing the atomic structure. Surface monolayer with hexagon cluster has low degree of order at high annealing temperature because of the fast liquid-like diffusive motion and improved glass-forming ability.



中文翻译:

退火对Cu 15 Zr 85非晶薄膜结晶行为的影响

采用分子动力学模拟在较宽的退火温度范围内研究了Cu 15 Zr 85非晶薄膜的结晶过程。评估了退火温度对结晶行为的影响。Cu 15 Zr 85的结晶度随退火温度的升高先增大后减小非晶薄膜。内部和Surface-A组分的比较表明,Surface-A组分在低退火温度下具有较高的结晶速率,在高退火温度下具有较低的结晶度,因为原子扩散速度较快。表面单层的结构演变在退火过程中是独一无二的。通过直接观察原子结构,在表面单层退火后没有发现可辨别的类晶体结构。具有六边形簇的表面单层在高退火温度下具有低有序度,因为它具有快速的液体状扩散运动和提高的玻璃形成能力。

更新日期:2021-06-22
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