In this study, He/O₂ plasma mixture, induced in a radio frequency (RF) low-pressure remote plasma system, has been characterized and employed for polymer surface modification. Actinometry optical emission spectroscopy (AOES) and Langmuir probe techniques were used to evaluate the plasma active species contributing to polymer surface modification. These active species involve the atomic oxygen [O] and the electrons (n_e). Five different polymers (poly(methyl methacrylate) [PMMA], polytetrafluoroethylene [PTFE], polyethylene [PE], polyvinyl chloride [PVC], and polystyrene [PS]) were plasma treated and subsequently characterized for etching rate, surface morphology using atomic force microscopy (AFM) technique, and chemical elemental composition using X-ray photoelectron spectroscopy (XPS) technique.

中文翻译：

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使用 He/O2 RF 远程低压等离子体进行聚合物表面改性

在这项研究中，在射频 (RF) 低压远程等离子体系统中诱导的He/O ₂等离子体混合物已被表征并用于聚合物表面改性。光度计发射光谱 (AOES) 和朗缪尔探针技术用于评估有助于聚合物表面改性的等离子体活性物质。这些活性物质涉及原子氧 [O] 和电子 ( n _e）。对五种不同的聚合物（聚（甲基丙烯酸甲酯）[PMMA]、聚四氟乙烯 [PTFE]、聚乙烯 [PE]、聚氯乙烯 [PVC] 和聚苯乙烯 [PS]）进行等离子体处理，随后使用原子力对蚀刻速率和表面形态进行表征显微镜 (AFM) 技术，以及使用 X 射线光电子能谱 (XPS) 技术的化学元素组成。