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Dislocation Etching Morphology on the A Plane of Sapphire Crystal
Crystal Research and Technology ( IF 1.5 ) Pub Date : 2021-06-12 , DOI: 10.1002/crat.202100022
Fuyang Cao 1 , Fei Li 1 , Zhiyong Yuan 1 , Lunyong Zhang 1 , Sida Jiang 1 , Hongxian Shen 1 , Zhiliang Ning 1 , Yongjiang Huang 1 , Dawei Xing 1 , Hongbo Zuo 2 , Jiecai Han 2 , Jianfei Sun 1
Affiliation  

In this work, the dislocation etching pit morphology and etching kinetics on the A-{11 2 ¯ 0} plane of sapphire crystal (α-Al2O3) are studied experimentally. The results show that the etch pit exhibits a subrhombic 3D morphology, which is consistent with the atom arrangement symmetry of the A plane. Further analysis shows that the two adjacent sides of the rhombic etch pits correspond to the directions [3 3 ¯ 0 1 ¯ ] and [3 3 ¯ 02], respectively; both of them are in the atomic close-packing direction of A plane. The etch pits are controlled by a chemical reaction between Al2O3 and potassium hydroxide (KOH) with the reaction activation energy of 51.7 kJ mol−1, which is developed in a manner of kinematic wave by the step moving with a constant speed.

中文翻译:

蓝宝石晶体A面的位错蚀刻形貌

在这项工作中,A -{11上的位错蚀刻坑形态和蚀刻动力学 2 ¯ 对蓝宝石晶体 (α-Al 2 O 3 ) 的0} 面进行了实验研究。结果表明,蚀刻坑呈现亚菱形的3D形貌,与A面的原子排列对称性一致。进一步分析表明,菱形蚀刻坑的两个相邻边对应的方向[3 3 ¯ 0 1 ¯ ] 和 [3 3 ¯ 02],分别;它们都在A平面的原子密堆积方向。蚀刻坑由Al 2 O 3与氢氧化钾(KOH)之间的化学反应控制,反应活化能为51.7 kJ mol -1,通过匀速步进运动以运动波的方式发展。
更新日期:2021-06-12
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