Physical properties and stress analysis of Si layers embedded in bi-layer periodic Mo/Si and W/Si multilayer mirrors operating in extreme ultraviolet and X-ray region of wavelengths were investigated by Raman scattering. The study showed that alternate Si layers in these multilayers were exist in the amorphous phase. This was determined from the peak shift and linewidth of the transverse optical (TO) phonon mode. This mode was blueshifted with an increase in the thickness of amorphous Si (a-Si) layers embedded in the Mo/Si multilayers and redshifted upon thermal annealing. In contrast, the redshift of this mode in a-Si with an increase of thickness was observed for W/Si multilayers, and blueshifted upon thermal annealing. The behavior of the TO phonon mode of a-Si was also influenced by the microstructure of metallic layers and the composite stress of multilayers. Thermally annealed multilayers showed a reduction of the period thickness due to defect annihilation of a-Si layers which lead to the change of reflection properties of mirrors.

通过拉曼散射研究了在极紫外和 X 射线波长区域工作的双层周期性 Mo/Si 和 W/Si 多层反射镜中嵌入的 Si 层的物理特性和应力分析。研究表明，这些多层中的交替 Si 层存在于非晶相中。这是由横向光学 (TO) 声子模式的峰值位移和线宽确定的。这种模式随着嵌入 Mo/Si 多层中的非晶硅 ( a -Si) 层的厚度增加而蓝移，并在热退火时发生红移。与此相反，该模式中的红移一个观察到W / Si多层膜-Si随着厚度的，并且在热退火蓝移。的声子模式的行为一-Si 还受到金属层的微观结构和多层复合应力的影响。热退火多层膜由于a -Si 层的缺陷湮没而显示出周期厚度的减小，这导致反射镜的反射特性发生变化。