Water Research ( IF 12.8 ) Pub Date : 2021-06-10 , DOI: 10.1016/j.watres.2021.117338 Min Sik Kim 1 , Changha Lee 2 , Jae-Hong Kim 3
The UV/H2O2 process is a benchmark advanced oxidation process (AOP) that in situ generates highly reactive and nonselective hydroxyl radical (•OH) to oxidatively destroy a wide range of organic compounds. Accurately quantifying the concentration of short-lived •OH is essential to predict process performance, optimize the operation parameters, and compare with other process options. The •OH concentration is typically measured using organic probe molecules that react with •OH but not with other oxidants. In the extremely well-characterized UV/H2O2 system in which •OH is proven to be the dominant oxidant, using photolysis-resistant probes such as benzoic acid and its derivatives is a widely agreed and practiced norm. We herein report that certain •OH probe compounds can be degraded in UV/H2O2 system by unknown reactive species that has not been reported in the past. Several common organic probes, particularly p-substituted benzoic acid compounds (i.e., p-hydroxybenzoic acid, p-chlorobenzoic acid, and p-phthalic acid), were found to be vulnerable to attack by the unknown reactive species, leading to false quantification of •OH concentration under high radical scavenging conditions. Lines of evidence obtained from a series of •OH scavenging experiments performed under various conditions (i.e., different concentrations of H2O2, •OH probe compounds, and dissolved oxygen) point toward excited state H2O2. The results from this study suggest the importance of using appropriate •OH probe compounds in mechanistic studies and needs for considering the unidentified role of excited state of H2O2 on the UV/H2O2 process and related AOPs.
中文翻译:
UV/H2O2 系统中未知活性物质的出现导致对羟基自由基探针反应的错误解释
UV/H 2 O 2工艺是一种基准的高级氧化工艺 (AOP),它原位生成高反应性和非选择性的羟基自由基 ( • OH) 以氧化破坏各种有机化合物。准确量化短寿命• OH的浓度对于预测工艺性能、优化操作参数以及与其他工艺选项进行比较至关重要。的• OH浓度是使用与反应的有机探针分子来测量• OH,但不与其它氧化剂。在特性极好的 UV/H 2 O 2系统中,•OH 被证明是主要的氧化剂,使用抗光解探针如苯甲酸及其衍生物是一种广泛认可和实践的规范。我们在此报告某些• OH 探针化合物可以在 UV/H 2 O 2系统中被过去未报道过的未知活性物质降解。发现几种常见的有机探针,特别是对取代苯甲酸化合物(即对羟基苯甲酸、对氯苯甲酸和对苯二甲酸)容易受到未知活性物质的攻击,导致对•高自由基清除条件下的 OH 浓度。从一系列在各种条件(即不同浓度的 H 2 O 2、• OH 探针化合物和溶解氧)下进行的• OH 清除实验中获得的证据指向激发态 H 2 O 2。这项研究的结果表明,在机理研究中使用适当的• OH 探针化合物很重要,并且需要考虑 H 2 O 2的激发态对 UV/H 2 O 2过程和相关 AOP的未知作用。