This study compares the impact of different plasma environments on the damage formation dynamics of polycrystalline monolayer graphene films on SiO₂/Si substrates and investigates the combined effects often observed in low-pressure argon plasmas. After careful characterization of the discharge properties by Langmuir probes and optical absorption spectroscopy, three operating conditions were selected to promote graphene irradiation by either positive ions, metastable species, or vacuum-ultraviolet (VUV) photons. In all cases, hyperspectral Raman imaging of graphene reveals plasma-induced damage. In addition, defect generation is systematically slower at grain boundaries (GBs) than within the grains, a behavior ascribed to a preferential self-healing of plasma-induced defects at GBs. The evolution of selected Raman band parameters is also correlated with the energy fluence provided to the graphene lattice by very-low-energy ions. From such correlation, it is shown that the presence of VUV photons enhances the defect formation dynamics through additional energy transfer. On the other hand, the presence of metastable species first impedes the defect generation and then promotes it for higher lattice disorder. While this impediment can be linked to an enhanced defect migration and self-healing at nanocrystallite boundaries in graphene, such effect vanishes in more heavily-damaged films.

本研究比较了不同等离子体环境对多晶单层石墨烯薄膜对SiO ₂损伤形成动力学的影响/Si 衬底并研究在低压氩等离子体中经常观察到的组合效应。在通过朗缪尔探针和光吸收光谱仔细表征放电特性后，选择了三种操作条件来促进正离子、亚稳态物质或真空紫外 (VUV) 光子对石墨烯的照射。在所有情况下，石墨烯的高光谱拉曼成像揭示了等离子体引起的损伤。此外，晶界 (GB) 处的缺陷生成系统地比晶粒内慢，这种行为归因于 GB 处等离子体诱导缺陷的优先​​自愈。所选拉曼能带参数的演变也与极低能离子提供给石墨烯晶格的能量注量相关。从这样的相关性，结果表明，真空紫外光子的存在通过额外的能量转移增强了缺陷形成动力学。另一方面，亚稳态物质的存在首先阻碍了缺陷的产生，然后促进了更高的晶格无序。虽然这种障碍可能与石墨烯中纳米晶边界处增强的缺陷迁移和自愈有关，但这种影响在损坏更严重的薄膜中消失。