The chemical and structural characteristics of a low-dimensional Au–Si surface alloy are presented in this work. Alloy formation was obtained by deposition of a sub-monolayer Si on Au(110). This preliminary phase to Si nano-ribbons is being investigated, as the transition from clean Au(110) to a silicon nano-ribbon coated surface is not yet understood. A multiple technique study has been carried out for detailed atomic structure determination and chemical investigation. Particular attention is paid to the clarification of the structural arrangement at the surface and at the interface. Using low-energy electron diffraction, the periodicity of the structure on long-range order could be examined. By means of high-precision photoemission measurements using synchrotron radiation, the electronic and atomic structure of the alloy can be presented. The investigation by photoelectron spectroscopy (XPS) using soft x-rays for a high surface sensitivity showed different chemical environments in the high-resolution spectra. The x-ray photoelectron diffraction (XPD) measurements, which are sensitive to the local atomic order, gave an approach to the structural configuration of the alloy. A new structural arrangement was found simulating both Au and Si XPD patterns. The results are compared to former proposed structure models. A deconvolution of the Si 2p XPD pattern revealed the origin of two chemically shifted XPS components.

本工作介绍了低维 Au-Si 表面合金的化学和结构特征。通过在 Au(110) 上沉积亚单层 Si 获得合金形成。由于尚不清楚从干净的 Au(110) 到硅纳米带涂层表面的过渡，因此正在研究这种形成硅纳米带的初步阶段。已经进行了多项技术研究，用于详细的原子结构测定和化学研究。特别注意澄清表面和界面处的结构排列。使用低能电子衍射，可以检查长程有序结构的周期性。通过使用同步辐射的高精度光电测量，可以呈现合金的电子和原子结构。使用软 X 射线进行高表面灵敏度的光电子能谱 (XPS) 研究表明，高分辨率光谱中的化学环境不同。X 射线光电子衍射 (XPD) 测量对局部原子顺序敏感，为合金的结构配置提供了一种方法。发现了一种新的结构排列来模拟 Au 和 Si XPD 图案。结果与以前提出的结构模型进行了比较。Si 2 的解卷积 发现了一种新的结构排列来模拟 Au 和 Si XPD 图案。结果与以前提出的结构模型进行了比较。Si 2 的解卷积 发现了一种新的结构排列来模拟 Au 和 Si XPD 图案。结果与以前提出的结构模型进行了比较。Si 2 的解卷积p XPD 模式揭示了两种化学位移 XPS 组分的起源。