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Simulation of tungsten target erosion and tungsten impurity transport during argon seeding on EAST
Plasma Physics and Controlled Fusion ( IF 2.2 ) Pub Date : 2021-06-08 , DOI: 10.1088/1361-6587/ac0351
Yilin Wang 1 , Chaofeng Sang 1 , Chen Zhang 1 , Xuele Zhao 1 , Yanjie Zhang 1 , Guozhang Jia 2 , I Yu Senichenkov 3 , Liang Wang 2 , Qingrui Zhou 1 , Dezhen Wang 1
Affiliation  

The upgrade of experimental advanced superconducting tokamak lower divertor to use tungsten (W) target is undertaken, however the target erosion and W impurity accumulation in the core pose a great challenge during high power discharge with external impurity seeding. This paper aims to study the influence of argon (Ar) seeding on the target erosion and the W impurity transport on steady-state operation. The scrape-off layer/divertor plasma as well as W impurity are self-consistently simulated by using SOLPS-ITER code package. With the constant input power, the Ar seeding rate is varied to study the changes on divertor plasma, incident Ar flux, the target erosion and W impurity transport. The simulation results indicate that the external Ar impurity influences W target erosion through both reducing the plasma temperature and introducing heavier incident particles, which significantly complicates the erosion process. The eroded W flux has great impact on the W core accumulation, and the divertor plasma condition influences W impurity transport remarkably. A correlation between peak electron temperature (T e) at the outer target and the W concentration (C W) at the core-edge-interface is found. Moreover, the influence of the W impurity on the background boundary plasma is also evaluated.



中文翻译:

EAST 上氩引晶过程中钨靶侵蚀和钨杂质迁移的模拟

实验性先进超导托卡马克下偏滤器升级为使用钨(W)靶材,但靶材侵蚀和芯部W杂质积累对外部杂质引种的高功率放电造成了巨大挑战。本文旨在研究氩 (Ar) 晶种对靶材侵蚀和 W 杂质传输对稳态操作的影响。使用 SOLPS-ITER 代码包对刮除层/偏流器等离子体以及 W 杂质进行自洽模拟。在输入功率恒定的情况下,改变 Ar 种晶率以研究偏滤器等离子体、入射 Ar 通量、靶材侵蚀和 W 杂质传输的变化。模拟结果表明,外部 Ar 杂质通过降低等离子体温度和引入更重的入射粒子来影响 W 靶的腐蚀,这使腐蚀过程显着复杂化。侵蚀 W 通量对 W 核积累有很大影响,偏滤器等离子体条件显着影响 W 杂质输运。峰值电子温度之间的相关性 ( 发现外部目标处的T e ) 和核心边缘界面处的W 浓度 ( C W )。此外,还评估了 W 杂质对背景边界等离子体的影响。

更新日期:2021-06-08
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