Abstract

Structural changes in silica glass, produced by electron irradiation, with electrons energies of 50 keV and doses of 5–80 mC/cm² were studied by Raman spectroscopy in frequency ranges of 300–550 and of 700–1500 cm^–1. It is shown that for irradiation doses less than 5 mC/cm² the decrease of siloxane rings concentration in glass takes place. The further increase of dose results in the increase of siloxane rings concentration in glass network after irrsdiation. And for doses of more than 40 mC/cm² the whole destruction of glass structure and its structural units takes place. The obtained results for silica glass were compared with similar results for crystalline quartz.

中文翻译：

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电子束辐照作用下二氧化硅玻璃的结构变化：辐照剂量的影响

摘要

通过拉曼光谱在 300-550 和 700-1500 cm ^{-1 的}频率范围内研究了由电子辐射产生的石英玻璃的结构变化，电子能量为 50 keV，剂量为 5-80 mC/cm ²。结果表明，对于小于 5 mC/cm ²的辐射剂量，玻璃中的硅氧烷环浓度会降低。剂量的进一步增加导致辐照后玻璃网络中硅氧烷环浓度的增加。对于超过 40 mC/cm ²的剂量，玻璃结构及其结构单元会发生整体破坏。将获得的石英玻璃结果与结晶石英的类似结果进行比较。