The paper investigates commercially pure titanium VT1-0 (US analog Grade 2) in the ultrafine grain state after the aluminum ion implantation at a fluence of 1∙10¹⁷, 5∙10¹⁷ and 10∙10¹⁷ ion/cm². The investigation techniques include X-ray diffraction analysis, scanning electron microscopy with energy dispersive X-ray analysis, and transmission electron microscopy. Auger electron spectrometer is used to analyze the chemical composition of the implanted layer. The grain size in the longitudinal and transverse directions and the phase composition of ultrafine titanium are studied depending on the irradiation exposure. It is found that the ion implantation leads to the formation of such intermetallic compounds as Al₃Ti and AlTi₃ phases, β-phase titanium and aluminum oxide (Al₂O₃). The increased irradiation exposure results in the formation of a thicker implanted layer without changing its phase composition.

该论文研究了在 1∙10 ¹⁷、5∙10 ¹⁷和 10∙10 ¹⁷离子/cm ²的通量下注入铝离子后超细晶粒状态的商业纯钛 VT1-0（美国模拟等级 2）。研究技术包括 X 射线衍射分析、具有能量色散 X 射线分析的扫描电子显微镜和透射电子显微镜。俄歇电子能谱仪用于分析注入层的化学成分。研究了纵向和横向的晶粒尺寸和超细钛的相组成取决于辐照暴露。发现离子注入导致形成Al ₃等金属间化合物Ti和AlTi ₃相、β相钛和氧化铝(Al ₂ O ₃ )。增加的辐射暴露导致形成更厚的注入层而不改变其相组成。