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Isoelectronic perturbations to f-d-electron hybridization and the enhancement of hidden order in URu2Si2 [Physics]
Proceedings of the National Academy of Sciences of the United States of America ( IF 11.1 ) Pub Date : 2021-05-18 , DOI: 10.1073/pnas.2026591118
Christian T Wolowiec 1, 2 , Noravee Kanchanavatee 1, 2 , Kevin Huang 1, 2 , Sheng Ran 1, 2 , Alexander J Breindel 1, 2 , Naveen Pouse 1, 2 , Kalyan Sasmal 1, 2 , Ryan E Baumbach 3, 4 , Greta Chappell 3, 4 , Peter S Riseborough 5 , M Brian Maple 2, 6
Affiliation  

Electrical resistivity measurements were performed on single crystals of URu2–xOsxSi2 up to x = 0.28 under hydrostatic pressure up to P = 2 GPa. As the Os concentration, x, is increased, 1) the lattice expands, creating an effective negative chemical pressure Pch(x); 2) the hidden-order (HO) phase is enhanced and the system is driven toward a large-moment antiferromagnetic (LMAFM) phase; and 3) less external pressure Pc is required to induce the HO→LMAFM phase transition. We compare the behavior of the T(x, P) phase boundary reported here for the URu2-xOsxSi2 system with previous reports of enhanced HO in URu2Si2 upon tuning with P or similarly in URu2–xFexSi2 upon tuning with positive Pch(x). It is noteworthy that pressure, Fe substitution, and Os substitution are the only known perturbations that enhance the HO phase and induce the first-order transition to the LMAFM phase in URu2Si2. We present a scenario in which the application of pressure or the isoelectronic substitution of Fe and Os ions for Ru results in an increase in the hybridization of the U-5f-electron and transition metal d-electron states which leads to electronic instability in the paramagnetic phase and the concurrent formation of HO (and LMAFM) in URu2Si2. Calculations in the tight-binding approximation are included to determine the strength of hybridization between the U-5f-electron states and the d-electron states of Ru and its isoelectronic Fe and Os substituents in URu2Si2.



中文翻译:

fd-电子杂化的等电子扰动和 URu2Si2 中隐藏顺序的增强 [物理学]

在高达P = 2 GPa 的静水压力下,对高达x = 0.28的 URu 2– x Os x Si 2单晶进行电阻率测量。随着 Os 浓度x的增加,1) 晶格膨胀,产生有效的负化学压力P ch ( x );2) 隐藏阶 (HO) 相位增强,系统被驱动到大力矩反铁磁 (LMAFM) 相位;3) 需要较少的外部压力P c来诱导 H2O→LMAFM 相变。我们比较T ( x ,P ) 此处报告的 URu 2- x Os x Si 2系统的相界,之前有报道称在用P调谐时URu 2 Si 2中的 H2O 增强,或在用正P ch调谐时在 URu 2– x Fe x Si 2 中类似地(× )。值得注意的是,压力、Fe 取代和 Os 取代是唯一已知的可增强 H2O 相并诱导 URu 2 Si 2 中LMAFM 相的一级转变的扰动. 我们提出了一个场景,其中施加压力或 Fe 和 Os 离子对 Ru 的等电子取代导致 U-5 f电子和过渡金属d电子态的杂化增加,从而导致电子不稳定顺磁相和在 URu 2 Si 2 中同时形成 H2O(和 LMAFM)。包括紧束缚近似中的计算,以确定 U-5 f电子态和Ru的d电子态之间的杂化强度及其在 URu 2 Si 2 中的等电子 Fe 和 Os 取代基。

更新日期:2021-05-11
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