ZnO thin films were deposited by RF magnetron sputtering using commercial sintered and in-house made powder targets. The structural, optical, chemical composition and surface morphology of the ZnO thin films were characterized by X-ray diffraction (XRD), Atomic Force Microscopy (AFM), Field Emission Scanning Electron Microscopy (FESEM), X-ray Photoelectron Spectroscopy (XPS), UV–Visible spectroscopy, Photoluminescence (PL) and Raman Spectroscopy. XRD data established that both films were c-axis oriented and the appearance of $E_{\mathrm{2H}}$ mode in Raman spectra confirmed the hexagonal wurtzite structure of the films. AFM micrographs revealed the homogeneity and nanocrystalline nature of the films. XPS and EDX studies confirmed that the films contained only Zn and O elements. Both the films showed superior optical properties and > 90% transmittance in the visible region. The results conclude that powder targets can be used to achieve complex/mixed metal oxide films having optical/electronic quality thereby overcoming the limitation of choice as in the case of commercial targets.

ZnO薄膜是使用商用烧结和自制粉末靶通过RF磁控溅射沉积的。通过X射线衍射（XRD），原子力显微镜（AFM），场发射扫描电子显微镜（FESEM），X射线光电子能谱（XPS）对ZnO薄膜的结构，光学，化学组成和表面形态进行了表征。 ，紫外可见光谱，光致发光（PL）和拉曼光谱。XRD数据表明，这两部薄膜都是c轴取向的，并且薄膜的外观$E_{\mathrm{2小时}}$拉曼光谱的模式证实了薄膜的六方纤锌矿结构。AFM显微照片揭示了膜的均质性和纳米晶体性质。XPS和EDX研究证实，该膜仅包含Zn和O元素。两种膜在可见光区域均显示出优异的光学性能和> 90％的透射率。结果得出结论，粉末靶可用于获得具有光学/电子质量的复杂/混合的金属氧化物膜，从而克服了商业靶情况下的选择限制。