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Compensation of Shallow Donors by Gallium Vacancies in Monoclinicβ-Ga2O3
Physical Review Applied ( IF 4.6 ) Pub Date : 2021-05-05 , DOI: 10.1103/physrevapplied.15.054010
Santosh K. Swain , Marc H. Weber , Jani Jesenovec , Muad Saleh , Kelvin G. Lynn , John S. McCloy

Knowledge of the origin of deep levels and their impact on electrical properties is critical for device applications of β-Ga2O3. By annealing under an oxygen (O2) atmosphere, the resistivity in shallow-donor (zirconium) doped β-Ga2O3:Zr single crystals is found to increase by more than 10 orders of magnitude to (7 ± 4) × 10 Ω cm, which is comparable to the resistivity achieved by iron (Fe) acceptor doping of (5 ± 3) × 10 Ω cm. We combine thermoelectric effect spectroscopy and positron annihilation spectroscopy (PAS), which are sensitive to deep levels and concentration of open-volume defects, with modeling of the electrical properties, to study these strongly compensated crystals. We find the compensating level in the O2-annealed β-Ga2O3:Zr sample to be located at (0.727 ± 0.021) eV (E2*) below the conduction band, which correlates with a vacancy signal from PAS data. The defect is most likely the relaxed split Ga vacancy VGai, rather than a simple gallium vacancy, considering theoretical predictions of a small energy barrier to relax. We observe that, due to the unique nature of these vacancies and anisotropy in the monoclinic lattice, the Doppler-broadening parameter is rather small compared with other wide-gap compounds, and in such a case the positron diffusion length is a suitable parameter to estimate the open-volume defect concentration.

中文翻译:

单斜β-Ga2O3中镓空位对浅层供体的补偿

深层次的根源及其对电性能影响的知识,对于器件应用的关键β -2个Ø3。通过在氧气下退火(Ø2个)气氛下,在浅施主(锆的电阻率)掺杂β -2个Ø3 发现单晶增加了10个数量级以上,达到(7±4)×10Ωcm,这与铁获得的电阻率相当()(5±3)×10Ωcm的受体掺杂。我们将热电效应光谱法和正电子an没光谱法(PAS)结合在一起,对深水平和开孔缺陷浓度敏感,并结合电学性质建模,以研究这些强补偿晶体。我们在Ø2个-annealed β -2个Ø3样品位于导带下方(0.727±0.021)eV(E 2 *),与PAS数据中的空位信号相关。缺陷很可能是松弛的裂缝 空缺 伏特一世,而不是简单的镓空位,而是要考虑到放松的较小能量壁垒的理论预测。我们观察到,由于这些空位的独特性质和单斜晶格中的各向异性,与其他宽隙化合物相比,多普勒展宽参数相当小,在这种情况下,正电子扩散长度是估算的合适参数开孔缺陷浓度。
更新日期:2021-05-06
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