The simultaneous use of KOH and nitrogen to manufacture carbon materials provides these materials with properties that the presence of only one of these additives would not give them, such as high porosity and reactivity. However, it is difficult to obtain nitrogen-doped carbon materials with both high porosity and high nitrogen content, as the KOH significantly reduces the nitrogen content. In this review the complex relationships between nitrogen content and nitrogen precursor amount, KOH amount and the activation temperature are discussed, with a focus on the different N-functional groups and the porosity of the fabricated carbons. Generally, increasing activation temperature and increasing KOH amount decrease the nitrogen content due to reactions with the N-containing substructures of carbon, resulting in the release of nitrogen as N₂, HCN and other N gases. Increasing these parameters can also result in the reduction of pyridine-N while the amount of quaternary-N increases simultaneously. Besides this, an increase in the amount of nitrogen precursor leads to an increase in the porosity of N-doped materials. However, too high amounts of the nitrogen precursor generate an excess of nitrogen which blocks the pore system and consequently reduces the porosity of the doped carbons.

同时使用KOH和氮来制造碳材料使这些材料具有仅这些添加剂中的一种不会提供的特性，例如高孔隙率和反应性。然而，由于KOH显着降低了氮含量，因此难以获得具有高孔隙率和高氮含量的掺氮碳材料。在这篇综述中，讨论了氮含量与氮前体含量，KOH含量和活化温度之间的复杂关系，重点是不同的N-官能团和所制造碳的孔隙率。通常，增加活化温度和增加KOH含量会降低与含碳亚结构的反应导致的氮含量，从而导致氮以N的形式释放出来。₂，HCN和其他N气。增加这些参数还可以导致吡啶-N的减少，而季铵-N的量同时增加。除此之外，氮前体的量的增加导致N掺杂材料的孔隙率的增加。但是，过量的氮前体会产生过量的氮，这会堵塞孔隙系统，从而降低掺杂碳的孔隙率。