For the fabrication of curved microstructures, the fabrication fidelity is greatly affected by the nonlinear relationship between the gray levels of the digital micromirror device (DMD) and the exposure dose in DMD gray-scale lithography. In this study, a method is proposed for the high fidelity fabrication of curved microstructures using DMD based dynamical ultraviolet lithography. A target curved microstructure is mapped into multiple discretized exposure profiles to control DMD mirrors. By extracting the same rows in all the discretized exposure profiles and arranging all the extracted rows in sequence, binary frame images to be exposed are constructed and then combined into a dynamical digital mask. With the proposed method, the nonlinear modulation of the DMD in gray-scale lithography is replaced with a linear binary modulation; thus, the dynamical modulation range of the DMD has been improved. We demonstrate the effectiveness of the method by theoretically simulating and experimentally fabricating a curved microlens array, compared with DMD gray-scale lithography. The experimental results show that the fabrication deviation in the edge region of the fabricated curved microlens array has been effectively decreased. This method may have great potential for the precision and low-cost industrial production of curved microstructures.

中文翻译：

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基于DMD的具有改进的动态调制范围的UV光刻方法，用于制造弯曲的微结构

对于弯曲的微结构的制造，数字微镜器件（DMD）的灰度级与DMD灰度光刻中的曝光剂量之间的非线性关系极大地影响了制造的保真度。在这项研究中，提出了一种使用基于DMD的动态紫外线光刻技术高保真度制造弯曲微结构的方法。将目标弯曲微结构映射到多个离散曝光配置文件以控制DMD反射镜。通过在所有离散曝光配置文件中提取相同的行并按顺序排列所有提取的行，可以构造要曝光的二进制帧图像，然后将其组合为动态数字蒙版。提出的方法用线性二进制调制代替了DMD在灰度光刻中的非线性调制。因此，DMD的动态调制范围得到了改善。与DMD灰度光刻相比，我们通过理论上模拟和实验制造弯曲微透镜阵列来证明该方法的有效性。实验结果表明，所制造的弯曲微透镜阵列的边缘区域中的制造偏差已被有效地减小。