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Application of broad-beam scanning exposure to fabricate low-wavefront-error holographic gratings
Optical Engineering ( IF 1.3 ) Pub Date : 2021-04-01 , DOI: 10.1117/1.oe.60.4.047105
Yuxuan Zhao 1 , Lijiang Zeng 1 , Lifeng Li 1
Affiliation  

Gratings with low diffracted wavefront errors are crucial in many applications. Existing methods to reduce the diffracted wavefront errors of holographically produced gratings mainly address misalignment errors during exposure system adjustment, leaving the inevitable residual errors of collimation lenses uncorrected. The broad-beam scanning exposure method was recently proposed to fabricate gratings with large size and low stray light. We explore its ability to reduce the diffracted wavefront errors caused by both system misalignment and lens errors. During the exposure, the substrate translates in the direction perpendicular to the grating lines to pass through the exposure area, so the aberrations over different parts of the interference field along the scanning path are averaged. We prove the validity of this method by a theoretical analysis and numerical simulations. The averaging effect on different aberrations and with different scanning lengths is discussed. The peak-valley values of diffracted wavefront errors of gratings fabricated with an exposure field of defocus aberration and a more complicated aberration were reduced by 42.5% and 50%, respectively.

中文翻译:

宽光束扫描曝光在制造低波前误差全息光栅中的应用

具有低衍射波前误差的光栅在许多应用中至关重要。减少全息图产生的光栅的衍射波前误差的现有方法主要解决曝光系统调整期间的对准误差,而使准直透镜不可避免的残留误差未得到校正。最近提出了宽光束扫描曝光方法来制造具有大尺寸和低杂散光的光栅。我们探索其减少由系统未对准和透镜误差引起的衍射波前误差的能力。在曝光期间,基板沿垂直于光栅线的方向平移以穿过曝光区域,因此沿扫描路径对干涉场的不同部分的像差进行平均。我们通过理论分析和数值模拟证明了该方法的有效性。讨论了平均对不同像差和不同扫描长度的影响。用散焦像差和更复杂像差的曝光场制造的光栅的衍射波前误差的峰谷值分别降低了42.5%和50%。
更新日期:2021-04-29
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