In this work, roughness scaling behavior of glancing angle deposited Zr thin films by DC magnetron sputtering at different substrate rotation speeds, have been studied using height-height correlation function (HHCF) and power spectral density (PSD) function analysis, from atomic force microscopy scans. The Zr thin films exhibit a local roughness exponent close to the unity. However, the growth exponent increases with rotation speed from 0.9 to 1.1. The PSD plot exhibits a characteristic peak, indicating a mound-like growth. Distance between mounds (characteristic length) decreases as rotation increases, demonstrating a reduction of the shadowing effect. It is concluded that the increase of beta is due to the remission process. Incoming atoms lose more kinetic energy when colliding with a substrate in motion, which leads an increase in the sticking coefficient.

在这项工作中，使用原子高度显微镜研究了高度-高度相关函数（HHCF）和功率谱密度（PSD）函数，研究了在不同基板转速下通过DC磁控管溅射掠过角度沉积的Zr薄膜的粗糙度定标行为。扫描。Zr薄膜的局部粗糙度指数接近于1。但是，增长指数随着旋转速度从0.9到1.1的增加而增加。PSD图显示出特征峰，表明丘状生长。土墩之间的距离（特征长度）随着旋转的增加而减小，这表明阴影效果降低了。可以得出结论，β的增加归因于缓解过程。当传入的原子与运动中的底物碰撞时，它们会损失更多的动能，