We describe a method for phase separating and transferring block copolymer (BCP) nanoscale patterns to arbitrary substrates for surface-independent nanolithography. The enabling technology is a hydrogenated or oxidized graphene thin film that only weakly adheres to its substrate. BCPs are applied to these graphene-based materials and solvent annealed to effect nanoscale phase separation. Then, taking advantage of the weak interaction of the graphene film and its substrate, the BCP/graphene stack is delaminated easily in water. A target substrate is then used to retrieve the stack, which can then serve as a lithographic mask. The use of water as a lift-off agent allows for chemically mild retrieval of the phase-separated BCP, extending the BCP lithography technique to essentially arbitrary substrates. We demonstrate this graphene-enabled BCP lithography on silicon nitride and polyethylene. We also show that using reduced graphene oxide (RGO) as a thin film enables the transfer of wafer-scale BCP films and lithography on SiO_x and Si. We use an RGO support to produce phase-separated BCP solvent-annealed patterns on polystyrene, a result which is not possible using standard BCP solvent annealing and which shows the utility of this technique. Finally, we demonstrate the ability to create nanopatterns of higher complexity by stacking multiple BCP masks, a capability that is not possible using conventional BCP lithography. This technique may have applications in fabricating nanoporous membranes and photonically active coatings.

我们描述了一种将嵌段共聚物 (BCP) 纳米级图案相分离和转移到任意基材的方法，用于表面独立的纳米光刻。使能技术是氢化或氧化的石墨烯薄膜，其仅微弱地粘附在其基板上。BCP 应用于这些基于石墨烯的材料并进行溶剂退火以实现纳米级相分离。然后，利用石墨烯薄膜与其基底的弱相互作用，BCP/石墨烯叠层在水中很容易分层。然后使用目标基板来取回堆叠，然后它可以用作光刻掩模。使用水作为剥离剂可以化学温和地回收相分离的 BCP，将 BCP 光刻技术扩展到基本上任意的基板。我们在氮化硅和聚乙烯上展示了这种启用石墨烯的 BCP 光刻。我们还表明，使用还原氧化石墨烯 (RGO) 作为薄膜可以在 SiO 上转移晶圆级 BCP 薄膜和光刻_x和 Si。我们使用 RGO 支持在聚苯乙烯上产生相分离的 BCP 溶剂退火图案，这是使用标准 BCP 溶剂退火无法实现的结果，并且显示了该技术的实用性。最后，我们展示了通过堆叠多个 BCP 掩模来创建更高复杂性的纳米图案的能力，这是使用传统 BCP 光刻无法实现的能力。该技术可用于制造纳米多孔膜和光子活性涂层。