A combinatorial thin-film synthesis approach together with a high throughput analysis methodology was successfully applied to synthetize TiN/Ni coatings with optimum mechanical properties. The synthesis approach consists of the deposition of TiN/Ni coatings with the Ni content ranging from around 0 to 20 at.% by reactive magnetron sputtering with a well-defined composition gradient, so that almost all possible compositions are produced in one single coating under identical conditions, removing uncertainties from processing conditions. The analysis methodology continuously screened the microstructure, residual stresses, hardness and fracture toughness of TiN/Ni coatings. The results show that a nanocomposite microstructure of equiaxed nanograins of crystalline δ-TiN embedded in a Ni rich amorphous phase is formed in the composition window between 8 and 12 Ni at.%. This microstructure offers a superior combination of hardness and toughness and a simultaneous reduction of residual stresses with respect to TiN coatings grown in the same conditions. Higher Ni contents are however detrimental because they compromise the integrity of the coatings.

组合薄膜合成方法和高通量分析方法已成功应用于合成具有最佳机械性能的TiN / Ni涂层。合成方法包括通过具有明确定义的成分梯度的反应磁控溅射沉积Ni含量在0至20 at。％之间的TiN / Ni涂层，从而几乎所有可能的成分都在一个单一的涂层下产生。相同的条件，消除了加工条件的不确定性。分析方法不断筛选TiN / Ni涂层的微观结构，残余应力，硬度和断裂韧性。结果表明，在8至12 Ni at。％之间的组成窗口中形成了嵌入富Ni非晶相中的δ-TiN晶体等轴纳米晶的纳米复合微观结构。相对于在相同条件下生长的TiN涂层，这种微结构提供了硬度和韧性的优异组合，同时减少了残余应力。然而，较高的Ni含量是有害的，因为它们损害了涂层的完整性。