In this study, nickel ions were implanted in brass at 2.0-MeV energy doses ranging from 1.9 × 10¹⁴, 4.8 × 10¹⁴, and 1.0 × 10¹⁵ ions cm⁻² at room temperature. Formation of micro size particle cluster, crater, void, rust, and flower-like structure were observed in scanning electron microscope (SEM) micrographs. XRD patterns explain the plane (1 1 1) and plane (2 2 0) under abrupt fluctuations, but in plane (2 0 0), systematic changes occur after ion implantation. Modifications in crystallite size, lattice strain, and dislocation density were discussed. In all the implanted specimens, values of hardness were smaller as compared with the unimplanted one. Precise changes occurred in the value of d-spacing that produced alteration in electrical conductivity at the initial ion doses. Therefore, electrical conductivity values were changed from 3.980E⁶ (S/m) to 2.966E⁷ (S/m). Further increment in the ion dose, electrical conductivity reduced to recover its value. Initial trend of hardness and electrical conductivity was nonlinear, but both tend to recuperate their values in the end. In FT-IR spectra, three new bands were formed at 1261, 1417, and 1455 cm⁻¹ after ion implantation that was due to change in bonding of brass.

中文翻译：

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Ni+离子注入对黄铜形貌、结构、硬度和电导率影响的研究

在这项研究中，镍离子在室温下以 2.0-MeV 的能量剂量注入黄铜中，能量剂量范围为 1.9 × 10 ¹⁴、4.8 × 10 ¹⁴和 1.0 × 10 ¹⁵ 离子 cm ^-2。在扫描电子显微镜 (SEM) 显微照片中观察到微尺寸颗粒簇的形成、火山口、空隙、铁锈和花状结构。XRD图谱解释了突然波动下的平面（1 1 1）和平面（2 2 0），但在平面（2 0 0）中，离子注入后会发生系统变化。讨论了微晶尺寸、晶格应变和位错密度的修改。在所有植入样品中，与未植入样品相比，硬度值都较小。d的值发生了精确的变化- 在初始离子剂量下产生电导率变化的间距。因此，电导率值从 3.980E ⁶ (S/m) 变为 2.966E ⁷ (S/m)。进一步增加离子剂量，电导率降低以恢复其值。硬度和电导率的初始趋势是非线性的，但最终都趋于恢复它们的值。在 FT-IR 光谱中，由于黄铜键合的变化，离子注入后在 1261、1417 和 1455 cm ^-1处形成了三个新谱带。