Abstract

Nanoscale MoO₃ films are obtained on the surface of a Mo single crystal by means of thermal oxidation and ion implantation. The optimal modes of ion implantation (the partial oxygen pressure, the ion energy and dose, and the annealing temperature) are determined to form homogeneous MoO₃/Mo films with thicknesses ranging from 30 to 100 Å and with good stoichiometry. It is established that, for low doses of oxygen ions (D ≤ 10¹⁶ cm^–2), nanoscale MoO₃ phases form on the Mo-crystal surface. The dependence of the degree of Mo surface coverage by MoO₃ cluster phases on the ion dose is determined. Films with a thickness of ~100 Å are obtained by successively implanting \({\text{O}}_{2}^{ + }\) ions with energies of 5, 3, and 1 keV. The composition, the electronic structure, and the emission and optical properties of the nanoscale phases and MoO₃ films are studied using a complex of methods (Auger- and photoelectron spectroscopy, secondary electron emission, and secondary-ion mass spectroscopy).

中文翻译：

---

热氧化和离子轰击形成纳米MoO 3薄膜的过程研究

摘要

通过热氧化和离子注入在Mo单晶的表面上获得纳米级的MoO ₃膜。确定离子注入的最佳模式（氧分压，离子能量和剂量以及退火温度）以形成均质的MoO ₃ / Mo膜，其厚度范围为30至100Å，并具有良好的化学计量比。已经确定，对于低剂量的氧离子（d ≤10 ¹⁶厘米^-2），纳米级的MoO _3个相形成的Mo-晶体表面上。MoO ₃对Mo表面覆盖度的依赖性确定离子剂量上的簇相。通过连续注入能量为5、3和1 keV的\（{\ text {O}} _ {2} ^ {+} \）离子可获得厚度约为100Å的薄膜。使用多种方法（俄歇和光电子能谱，二次电子发射和二次离子质谱）研究了纳米级相和MoO ₃膜的组成，电子结构以及发射和光学性质。