This article describes a miniature electron beam scanning system based on an octupole electrode as the key stage of the implementation of the MEMS electron microscope. The scanning system consists of a silicon electrode with a central hole, containing 8 properly powered elements and a special electronic system controlling voltage. Octupole electrode was made using MEMS technology. First, it was examined using computer simulations, and then the operation of the octupole system was tested using a reference electron beam in the SEM JEOL microscope. The scanning system parameters depend on the electron beam energy, distance between the octupole and the sample, and the applied voltage. It is possible either to obtain an octupole scanning system resolution of 27 nm (for electron beam energy E = 4 keV and octupole observation plane distance H = 1 mm) or a large scanning area up to 2.7 mm (E = 4 keV, H = 20 mm), without any significant distortion of the sample image. Subsequently, the first model of the MEMS electron microscope microcolumn was assembled, containing the field-emission cathode, an extraction electrode, a focusing electrode, an octupole electrode, and an anode. The first images of the observed hexagonal metal grid placed on the silicon anode were recorded inside a reference high vacuum chamber.

本文介绍了一种基于八极电极的微型电子束扫描系统，该系统是实现MEMS电子显微镜的关键阶段。扫描系统由一个带有中心孔的硅电极组成，该电极包含8个适当供电的元件以及一个控制电压的特殊电子系统。八极电极采用MEMS技术制成。首先，使用计算机模拟对其进行检查，然后使用SEM JEOL显微镜中的参考电子束测试八极系统的运行情况。扫描系统参数取决于电子束能量，八极子与样品之间的距离以及所施加的电压。可能获得27 nm的八极扫描系统分辨率（对于电子束能量E = 4 keV和八极观测平面距离H  = 1 mm）或最大2.7 mm的大扫描区域（E  = 4 keV，H  = 20 mm），而样本图像没有任何明显的变形。随后，组装了MEMS电子显微镜微柱的第一个模型，其中包含场发射阴极，引出电极，聚焦电极，八极电极和阳极。观察到的放置在硅阳极上的六角形金属网格的第一张图像记录在参考高真空室内。