Periodic microscale array structures play an important role in diverse applications involving photonic crystals and diffraction gratings. A polarized holographic lithography system is proposed for patterning high-uniformity microscale two-dimensional crossed-grating structures with periodic tunability. Orthogonal two-axis Lloyd’s mirror interference and polarization modulation produce three sub-beams, enabling the formation of two-dimensional crossed-grating patterns with wavelength-comparable periods by a single exposure. The two-dimensional-pattern period can also be flexibly tuned by adjusting the interferometer spatial positioning. Polarization states of three sub-beams, defining the uniformity of the interference fringes, are modulated at their initial-polarization states based on a strict full polarization tracing model in a three-dimensional space. A polarization modulation model is established considering two conditions of eliminating the unexpected interference and providing the desired identical interference intensities. The proposed system is a promising approach for fabricating high-uniformity two-dimensional crossed gratings with a relatively large grating period range of 500–1500 nm. Moreover, our rapid and stable approach for patterning period-tunable two-dimensional-array microstructures with high uniformity could be applicable to other multibeam interference lithography techniques.

周期性微尺度阵列结构在涉及光子晶体和衍射光栅的各种应用中发挥着重要作用。提出了一种偏振全息光刻系统，用于图案化具有周期性可调性的高均匀度微尺度二维交叉光栅结构。正交两轴劳埃德镜面干涉和偏振调制产生三个子光束，从而能够通过单次曝光形成具有波长可比周期的二维交叉光栅图案。还可以通过调整干涉仪空间定位来灵活调整二维图案周期。三个子光束的偏振态，定义干涉条纹的均匀性，在三维空间中基于严格的全极化跟踪模型在其初始极化状态下进行调制。考虑消除意外干扰和提供所需的相同干扰强度两个条件，建立偏振调制模型。所提出的系统是一种有前途的方法，用于制造具有 500-1500 nm 的相对较大光栅周期范围的高均匀性二维交叉光栅。此外，我们用于图案化具有高均匀性的周期可调二维阵列微结构的快速稳定方法可适用于其他多光束干涉光刻技术。考虑消除意外干扰和提供所需的相同干扰强度两个条件，建立偏振调制模型。所提出的系统是一种有前途的方法，用于制造具有 500-1500 nm 的相对较大光栅周期范围的高均匀性二维交叉光栅。此外，我们用于图案化具有高均匀性的周期可调二维阵列微结构的快速稳定方法可适用于其他多光束干涉光刻技术。考虑消除意外干扰和提供所需的相同干扰强度两个条件，建立偏振调制模型。所提出的系统是一种有前途的方法，用于制造具有 500-1500 nm 的相对较大光栅周期范围的高均匀性二维交叉光栅。此外，我们用于图案化具有高均匀性的周期可调二维阵列微结构的快速稳定方法可适用于其他多光束干涉光刻技术。