Ionized jet deposition (IJD) is a pulse electron deposition method. It can be used for the preparation of thin films from a wide spectrum of materials on different substrates. The main benefits of IJD are high flexibility and a possibility to change many of the deposition parameters. Some of them even during the deposition such as acceleration voltage, working gas, substrate temperature, etc. The wide variability of the deposition parameters allows finding the ideal conditions for the preparation of thin films of almost any material. This deposition method has a great potential for a cost-effective scale-up of HTS (High-temperature Superconductors) tapes fabrication. This research is focused on the study of the influence of target density on the microstructure of the deposited YBCO thin layers. The target density has an important role in the morphology of thin films. In this work, the deposition parameters were fixed (except for target density). The distance between substrate and target was 110 mm and substrate temperatures were set to 650 °C. The targets and samples were examined by scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), and LED Confocal profilometer. Nine different YBCO targets with densities from 3.8 g·cm ⁻³ to 5.6 g·cm ⁻³ were prepared in total. All targets were prepared from a single batch of precursor powder at ambient atmosphere and different sintering temperatures and times.

中文翻译：

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靶密度对电离喷射沉积Y-Ba-Cu-O薄膜表面形貌的影响

电离喷射沉积（IJD）是脉冲电子沉积方法。它可用于在不同的基材上由多种材料制备薄膜。IJD的主要好处是灵活性高，并且可以更改许多沉积参数。其中一些甚至在沉积过程中，例如加速电压，工作气体，衬底温度等。沉积参数的广泛变化性使得可以找到制备几乎任何材料的薄膜的理想条件。这种沉积方法具有高成本效益地扩大HTS（高温超导体）胶带制造的潜力。这项研究的重点是研究靶密度对沉积的YBCO薄层微观结构的影响。目标密度在薄膜的形态中具有重要作用。在这项工作中，沉积参数是固定的（目标密度除外）。基材与靶材之间的距离为110毫米，基材温度设置为650°C。通过扫描电子显微镜（SEM），能量色散光谱（EDS）和LED共聚焦轮廓仪对目标和样品进行了检查。九种不同的YBCO靶，密度从3.8 g·cm开始 总共准备了^-3至5.6g·cm ^-3。所有靶材均是由一批前体粉末在环境气氛下以及不同的烧结温度和时间下制备的。