Shaping the optical wavefront utilizing spatial light modulators (SLMs) is a valuable methodology for modification of a focal spot. It has numerous applications in microscopy, particularly in scattering media. Optical lithography techniques, i.e. multiphoton lithography, can also benefit from wavefront shaping. In this contribution, we present focus optimization in multiphoton lithography through a scattering medium. Beam shaping of a femtosecond-pulsed laser pulse was achieved using a liquid-crystal SLM. For the feedback system a low-cost approach, using a Raspberry Pi-camera in Bayer-mode was applied. Images of the focal spot were used as input for an evolutionary algorithm to improve focus quality.

利用空间光调制器（SLM）塑造光波阵面是修改焦点的一种有价值的方法。它在显微镜检查中有许多应用，特别是在散射介质中。光学光刻技术，即多光子光刻技术，也可以从波前整形中受益。在此贡献中，我们提出了通过散射介质在多光子光刻中进行焦点优化的方法。飞秒脉冲激光脉冲的光束整形是使用液晶SLM实现的。对于反馈系统，采用了采用拜耳模式的Raspberry Pi相机的低成本方法。焦点的图像用作进化算法的输入，以提高焦点质量。