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Mechanical-stressing measurements of formation energy of single Shockley stacking faults in 4H-SiC
Applied Physics Express ( IF 2.3 ) Pub Date : 2021-03-10 , DOI: 10.35848/1882-0786/abeaf8
Koji Maeda , Koichi Murata , Isaho Kamata , Hidekazu Tsuchida

The formation energy ${\gamma }_{{\rm{ISSF}}}^{{\rm{eq}}.}$ of single Shockley stacking faults (1SSFs) in thermo-equilibrium is crucial for validating the anomalous expansion mechanism of 1SSF induced by forward current injection in 4H-SiC bipolar devices. As a function of variable mechanical stress externally applied to a plate sample of 4H-SiC, we systematically measured the ultraviolet intensity thresholds demarcating photo-induced expansion and contraction of 1SSFs. The experimental results on two types of 1SSF differing in the Schmid factor of mobile partial dislocations achieving 1SSF expansion/contraction showed a ${\gamma }_{{\rm{ISSF}}}^{{\rm{eq}}.}$ value of 4.71.6 mJ m−2, significantly smaller than the reported value of 142.5 mJ m−2 obtained by transmission electron microscopic measurements.



中文翻译:

4H-SiC中单个肖克利堆垛层错形成能的机械应力测量

$ {\ gamma} _ {{\ rm {ISSF}}} ^ {{\ rm {eq}}。} $热平衡中单个Shockley堆垛层错(1SSF)的形成能量对于验证4H-SiC双极器件中正向电流注入引起的1SSF异常膨胀机制至关重要。根据外部施加到4H-SiC板样品上的可变机械应力的函数,我们系统地测量了界定1SSFs的光诱导膨胀和收缩的紫外线强度阈值。对两种能实现1SSF扩展/收缩的移动部分位错的Schmid因子的Schmid因子不同的1SSF的实验结果表明,其$ {\ gamma} _ {{\ rm {ISSF}}} ^ {{\ rm {eq}}。} $值为4.71.6 mJ m -2,显着小于通过透射电子获得的报道值142.5 mJ m -2。显微测量。

更新日期:2021-03-10
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